Fabrication of Si mold with smooth side wall by new plasma etching process

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1140-1143

  Kawata, Hiroaki ^a   Yasuda, Masaaki ^a   Hirai, Yoshihiko ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Bosch process; Imprint mold; SF6 plasma; Silicon deep etching; Smooth side wall; Teflon coat

Indexed keywords

ELECTRODES; PLASMA ETCHING; PLASTIC FILMS; POLYMETHYL METHACRYLATES; POLYTETRAFLUOROETHYLENES; SILICON;

BOSCH PROCESS; IMPRINT MOLDS; SILICON DEEP ETCHING; SMOOTH SIDE WALLS; TEFLON COATINGS;

MICROFABRICATION;

EID: 34247580210     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.216     Document Type: Article

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