Multilayer resist methods for nanoimprint lithography on nonflat surfaces

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3922-3925

  Sun, Xiaoyun ^a   Zhuang, Lei ^a   Zhang, Wei ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 9644257711     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590437     Document Type: Article

References (5)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 76, 3114 (1995); Science 272, 85 (1996).
2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 76, 3114 (1995); Science 272, 85 (1996).
3. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, J. Vac. Sci. Technol. B 15, 2897 (1997).
4. L. H. Sperling, Introduction to Physical Polymer Science, 2nd ed. (Wiley, New York, 1992), pp. 352-353.
5. Purchased from Brewer Science Inc., 2401 Brewer Drive, Rolla, MO 65401.