Room-temperature and low-pressure nanoimprint lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 371-377

  Lebib, A ^a   Chen, Y ^a   Cambril, E ^a   Youinou, P ^a   Studer, V ^a   Natali, M ^a   Pepin A ^a   Janssen, H M ^b   Sijbesma, R P ^b  

^a CNRS   (France)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Nanofabrication; Nanoimprint lithography; Polymers

Indexed keywords

DIFFRACTION GRATINGS; GLASS TRANSITION; MICROELECTRONICS; NANOTECHNOLOGY; POLYMERS; PRESSURE EFFECTS; THERMAL EFFECTS; VISCOSITY;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036643868     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00485-9     Document Type: Conference Paper

References (7)

1. Nanoimprint techniques