A contribution to the flow behaviour of thin polymer films during hot embossing lithography

Microelectronic Engineering

Volumn 56, Issue 3-4, 2001, Pages 311-332

  Scheer, H C ^a   Schulz, H ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Flow behaviour; Hot embossing lithography; Nanoimprint lithography

Indexed keywords

FLOW OF FLUIDS; GLASS TRANSITION; LITHOGRAPHY; VISCOELASTICITY;

HOT EMBOSSING LITHOGRAPHY (HEL); NANOIMPRINT LITHOGRAPHY (NIL);

PLASTIC FILMS;

EID: 0035422490     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00569-X     Document Type: Article

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