Pressure and resist thickness dependency of resist time evolutions profiles in nanoimprint lithography

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 842-845

  Hirai, Yoshihiko ^a   Onishi, Yuki ^b   Tanabe, Toshiaki ^a   Shibata, Mayuko ^a   Iwasaki, Takuya ^b   Iriye, Yasuroh ^b  

^a Osaka Prefecture University   (Japan)

^b MIZUHO INFORMATION AND RESEARCH INSTITUTE   (Japan)

Author keywords

Deformation; Nanoimprint; Polymer; Pressure; Resist thickness; Time evolution; Vico elastic

Indexed keywords

COMPUTER SIMULATION; DEFORMATION; NANOIMPRINT LITHOGRAPHY; PRESSURE EFFECTS; THICKNESS MEASUREMENT;

IMPRINT PRESSURE; RESIST PROFILES; RESISTS;

POLYMERS;

DEFORMATION; LITHOGRAPHY; POLYMERS;

EID: 44149091962     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.084     Document Type: Article

References (5)

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