Lift-off process for nanoimprint lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 203-207

  Carlberg, P ^a   Graczyk, M ^a   Sarwe, E L ^a   Maximov, I ^a   Beck, M ^a   Montelius, L ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

Lift off; Nanoimprint lithography; Pattern transfer

Indexed keywords

ACETONE; ELECTRON BEAM LITHOGRAPHY; ELECTROSTATICS; ISOTOPES;

NANOIMPRINT LITHOGRAPHY;

POLYMETHYL METHACRYLATES;

EID: 0038697354     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00072-8     Document Type: Conference Paper

References (9)

1. Chou S.Y., Krauss P.R., Renstrom P.J. Appl. Phys. Lett. 67:1995;3114.
2. Bender M., Otto M., Hadam B., Vratzov B., Spangenberg B., Kurz H. Microelectron. Eng. 53:2000;233.
3. Bailey T.C., et al. Microelectron Eng. 61-62:2002;461.
4. Lebib A., et al. Microelectron Eng. 61-62:2002;371.
5. Chou S.Y., Krauss P.R., Zhang W., Guo L., Zhuang L. J. Vac. Sci. Technol. B15:1997;2897.
6. P. Carlberg, M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, L. Montelius, K. Pfiffer, F. Reuther, G. Gruetzner, Poster NANO7/ECOSS21, Malmo, Sweden, 2002.
7. Maximov I., Sarwe E.-L., Beck M., Deppert K., Graczyk M., Magnusson M.H., Montelius L. Microelectron Eng. 61-62:2002;449.
8. Beck M., Graczyk M., Maximov I., Sarwe E.-L., Ling T.G.I., Kiel M., Montelius L. Microelectron Eng. 61-62:2002;441.
9. Hirai Y., Fujiwara M., Okuno T., Tanaka Y., Endo M., Irie S., Nakagawa K., Sasago M. J. Vac. Sci. Technol. B19:2001;2811.