-
1
-
-
0031074686
-
Imprint lithography with sub-10 nm feature size and high throughput
-
Chou S and Krauss P 1997 Imprint lithography with sub-10 nm feature size and high throughput Microelectron. Eng. 35 237-40
-
(1997)
Microelectron. Eng.
, vol.35
, Issue.1-4
, pp. 237-240
-
-
Chou, S.1
Krauss, P.2
-
2
-
-
0000781784
-
Wafer-scale sub-micron lithography
-
Khang D and Lee H 1999 Wafer-scale sub-micron lithography Appl. Phys. Lett. 75 2599-601
-
(1999)
Appl. Phys. Lett.
, vol.75
, Issue.17
, pp. 2599-2601
-
-
Khang, D.1
Lee, H.2
-
3
-
-
3242676271
-
Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography
-
Austin M D et al 2004 Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography Appl. Phys. Lett. 84 5299-301
-
(2004)
Appl. Phys. Lett.
, vol.84
, Issue.26
, pp. 5299-5301
-
-
Austin, M.D.1
Al, E.2
-
4
-
-
10844291014
-
Polymer imprint lithography with molecular-scale resolution
-
Hua G et al 2004 Polymer imprint lithography with molecular-scale resolution Nano Lett. 4 2467-71
-
(2004)
Nano Lett.
, vol.4
, Issue.12
, pp. 2467-2471
-
-
Hua, G.1
Al, E.2
-
5
-
-
0036502497
-
Hot embossing in microfabrication: Part II. Rheological characterization and process analysis
-
Juang Y-J, Lee L J and Koelling K W 2002 Hot embossing in microfabrication: Part II. Rheological characterization and process analysis Poly. Eng. Sci. 42 551-66
-
(2002)
Poly. Eng. Sci.
, vol.42
, Issue.3
, pp. 551-566
-
-
Juang, Y.-J.1
Lee, L.J.2
Koelling, K.W.3
-
6
-
-
10844295994
-
Polymer deformation and filling modes during microembossing
-
Rowland H D and King W P 2004 Polymer deformation and filling modes during microembossing J. Micromech. Microeng. 14 1625-32
-
(2004)
J. Micromech. Microeng.
, vol.14
, Issue.12
, pp. 1625-1632
-
-
Rowland, H.D.1
King, W.P.2
-
8
-
-
0034508819
-
Flow behaviour of thin polymer films used for hot embossing lithography
-
Heyderman L J et al 2000 Flow behaviour of thin polymer films used for hot embossing lithography Microelectron. Eng. 54 229-45
-
(2000)
Microelectron. Eng.
, vol.54
, Issue.3-4
, pp. 229-245
-
-
Heyderman, L.J.1
Al, E.2
-
9
-
-
2442479009
-
Flow behavior at the embossing stage of nanoimprint lithography
-
Jeong J-H et al 2002 Flow behavior at the embossing stage of nanoimprint lithography Fibers Poly. 3 113-9
-
(2002)
Fibers Poly.
, vol.3
, pp. 113-119
-
-
Jeong, J.-H.1
Al, E.2
-
10
-
-
0035519113
-
Study of the resist deformation in nanoimprint lithography
-
Hirai Y et al 2001 Study of the resist deformation in nanoimprint lithography J. Vacuum Sci. Technol. B 19 2811-5
-
(2001)
J. Vacuum Sci. Technol.
, vol.19
, Issue.6
, pp. 2811-2815
-
-
Hirai, Y.1
Al, E.2
-
11
-
-
13244279801
-
Simulation and experimental study of polymer deformation in nanoimprint lithography
-
Hirai Y et al 2004 Simulation and experimental study of polymer deformation in nanoimprint lithography J. Vacuum Sci. Technol. B 22 3288-93
-
(2004)
J. Vacuum Sci. Technol.
, vol.22
, Issue.6
, pp. 3288-3293
-
-
Hirai, Y.1
Al, E.2
-
12
-
-
0037395176
-
Study of PMMA recoveries on micrometric patterns replication by nano-imprint lithography
-
Martin C, Ressier L and Peyrade J P 2003 Study of PMMA recoveries on micrometric patterns replication by nano-imprint lithography Physica E 17 523-5
-
(2003)
Physica
, vol.17
, Issue.1-4
, pp. 523-525
-
-
Martin, C.1
Ressier, L.2
Peyrade, J.P.3
-
13
-
-
0032535592
-
Simulation of three-dimensional polymer mould filling processes using a pseudo-concentration method
-
Haagh G A AV and Van De Vosse F N 1998 Simulation of three-dimensional polymer mould filling processes using a pseudo-concentration method Int. J. Numer. Methods Fluids 28 1355-69
-
(1998)
Int. J. Numer. Methods Fluids
, vol.28
, Issue.9
, pp. 1355-1369
-
-
Haagh, G.A.A.V.1
Van De Vosse, F.N.2
-
15
-
-
0030118725
-
A Newton-Raphson pseudo-solid domain mapping technique for free and moving boundary problems: A finite element implementation
-
Sackinger P A, Schunk P R and Rao R R 1996 A Newton-Raphson pseudo-solid domain mapping technique for free and moving boundary problems: a finite element implementation J. Comput. Phys. 125 83-103
-
(1996)
J. Comput. Phys.
, vol.125
, Issue.1
, pp. 83-103
-
-
Sackinger, P.A.1
Schunk, P.R.2
Rao, R.R.3
-
17
-
-
27944442622
-
-
Schunk P R 1999 TALE: an arbitrary Lagrangian-Eulerain approach to fluid-structure interaction problems Sandia Technical Report (unpublished) Sandia National Laboratories
-
(1999)
Sandia Technical Report
-
-
Schunk, P.R.1
-
18
-
-
0030211495
-
Viscoelastic properties of narrow-distribution poly(methyl methacrylates)
-
Fuchs K, Friedrich C and Weese J 1996 Viscoelastic properties of narrow-distribution poly(methyl methacrylates) Macromolecules 29 5893-901
-
(1996)
Macromolecules
, vol.29
, Issue.18
, pp. 5893-5901
-
-
Fuchs, K.1
Friedrich, C.2
Weese, J.3
-
19
-
-
0036544032
-
Microplastic embossing process: Experimental and theoretical characterizations
-
Shen X J, Pan L-W and Lin L 2002 Microplastic embossing process: experimental and theoretical characterizations Sensors Actuators A 97-98 428-33
-
(2002)
Sensors Actuators
, vol.97-98
, Issue.1-2
, pp. 428-433
-
-
Shen, X.J.1
Pan, L.-W.2
Lin, L.3
-
20
-
-
0035422490
-
A contribution to the flow behaviour of thin polymer films during hot embossing lithography
-
Scheer H C and Schulz H 2001 A contribution to the flow behaviour of thin polymer films during hot embossing lithography Microelectron. Eng. 56 311-32
-
(2001)
Microelectron. Eng.
, vol.56
, Issue.3-4
, pp. 311-332
-
-
Scheer, H.C.1
Schulz, H.2
-
22
-
-
0003825067
-
Analysis of transport phenomena
-
Deen W M 1998 Analysis of transport phenomena Topics in Chemical Engineering ed K T Gubbins (New York: Oxford University Press) p 597
-
(1998)
Topics in Chemical Engineering
, pp. 597
-
-
Deen, W.M.1
-
23
-
-
17044413748
-
Influence of elastic strains on the mask ratio in glassy polymer nanoimprint
-
Cross G L W, O'Connell B S and Pethica J B 2005 Influence of elastic strains on the mask ratio in glassy polymer nanoimprint Appl. Phys. Lett. 86 081902
-
(2005)
Appl. Phys. Lett.
, vol.86
-
-
Cross, G.L.W.1
O'Connell, B.S.2
Pethica, J.B.3
-
24
-
-
27944477078
-
-
note
-
Example embossing process variables and geometry from simulations of this paper.
-
-
-
-
25
-
-
10044228559
-
In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry
-
Yu Z, Gao H and Chou S Y 2004 In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry Appl. Phys. Lett. 85 4166-8
-
(2004)
Appl. Phys. Lett.
, vol.85
, Issue.18
, pp. 4166-4168
-
-
Yu, Z.1
Gao, H.2
Chou, S.Y.3
|