메뉴 건너뛰기




Volumn 74, Issue 16, 1999, Pages 2381-2383

Nanoscale GaAs metal-semiconductor-metal photodetectors fabricated using nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEGRADATION; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR METAL BOUNDARIES; SUBSTRATES;

EID: 0032620446     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123858     Document Type: Article
Times cited : (56)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.