Imprinting polymer film on patterned substrates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2742-2748

  Tan, L ^a   Kong, Y P ^b   Bao, L R ^a   Huang, X D ^b   Guo, L J ^a   Pang, S W ^a   Yee, A F ^a,b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DEFORMATION; ELASTOMERS; INTERFACIAL ENERGY; LOW TEMPERATURE EFFECTS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHOTORESISTS; POLYMETHYL METHACRYLATES; PRESSURE EFFECTS; SILICON WAFERS; SPIN COATING; SURFACE TOPOGRAPHY;

CONFORMAL COATINGS; FILM TRANSFER; PATTERNING TECHNIQUES;

PLASTIC FILMS;

EID: 0942300056     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1624258     Document Type: Conference Paper

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