Simulation and experimental study of polymer deformation in nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3288-3293

  Hirai, Yoshihiko ^a   Konishi, Takaaki ^a   Yoshikawa, Takashi ^a   Yoshida, Satoshi ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; DEFORMATION; GLASS TRANSITION; MOLECULAR WEIGHT; NANOTECHNOLOGY; POLYMERS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; THICKNESS CONTROL;

MOLD GROOVES; NANOIMPRINT LITHOGRAPHY (NIL); POLYMER DEFORMATION PROCESS;

LITHOGRAPHY;

EID: 13244279801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1826058     Document Type: Conference Paper

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