SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 19, Issue 4, 2007, Pages 495-513

Nanoimprint lithography: Methods and material requirements

(1) Guo, L Jay a

a UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; NANOSTRUCTURES; PHOTONS; SURFACE PROPERTIES;

BEAM SCATTERING; IMPRINTING MOLD; RESIST MATERIAL;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; SURFACE PROPERTIES;

EID: 34250642011 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200600882 Document Type: Article

Times cited : (1610)

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