In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Applied Physics Letters

Volumn 85, Issue 18, 2004, Pages 4166-4168

  Yu, Zhaoning ^a   Gao, He ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRATING LINES; NANOIMPRINT LITHOGRAPHY; SILICA GRATING MOLDS; TIME-RESOLVED DIFFRACTIVE SCATTEROMETRY;

CHARACTERIZATION; ELECTROMAGNETIC WAVE DIFFRACTION; NANOTECHNOLOGY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; WETTING;

LITHOGRAPHY;

EID: 10044228559     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1811396     Document Type: Article

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