Rigiflex lithography for nanostructure transfer

Advanced Materials

Volumn 17, Issue 12, 2005, Pages 1554-1560

  Suh, Dongchul ^a   Choi, Se Jin ^b   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

^b Minuta Tech   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; GLASS TRANSITION; HYDROPHILICITY; MULTILAYERS; NANOSTRUCTURED MATERIALS; PLASTIC FILMS; POISSON RATIO; POLYETHYLENE TEREPHTHALATES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

BILAYER-TRANSFER TECHNIQUE (BLT); LEWIS ACIDS; RIGIFLEX LITHOGRAPHY; RIGIFLEX MOLD;

PHOTOLITHOGRAPHY;

EID: 20644436244     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200402010     Document Type: Article

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