Multistep profiles by mix and match of nanoimprint and UV lithography

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 381-387

  Pfeiffer, K ^a   Fink, M ^a   Gruetzner, G ^a   Bleidiessel, G ^b   Schulz, H ^b   Scheer, H ^b  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; POLYMERS;

NANOIMPRINT LITHOGRAPHY (NIL);

MICROELECTRONICS;

EID: 0035450338     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00537-8     Document Type: Article

References (6)