Interferometric in situ alignment for UV-based nanoimprint

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3242-3245

  Fuchs, A ^a   Vratzov, B ^a   Wahlbrink, T ^a   Georgiev, Y ^a   Kurz, H ^a  

^a AMO GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; INTERFEROMETRY; PRESSURE; SILICA; SINGLE CRYSTALS; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

ALIGNMENT CONCEPT; CROSSBAR ALIGNMENTS; MOLD PATTERNS; UV-BASED NANOIMPRINT LITHOGRAPHY (UV-NIL);

NANOTECHNOLOGY;

EID: 13244275355     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808735     Document Type: Conference Paper

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