Simulations of nonuniform embossing: The effect of asymmetric neighbor cavities on polymer flow during nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2958-2962

  Rowland, Harry D ^a   King, William P ^a,c   Sun, Amy C ^b   Schunk, P Randy ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFORMATION; LITHOGRAPHY; MATHEMATICAL MODELS; NANOTECHNOLOGY; VISCOSITY;

EMBOSSING TOOLS; NANOIMPRINT LITHOGRAPHY (NIL); NONUNIFORM EMBOSSING; VISCOUS POLYMER FLOW;

POLYMERS;

EID: 29044433203     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2127939     Document Type: Article

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