A comparison of thermally and photochemically cross-linked polymers for nanoimprinting

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 266-273

  Pfeiffer, K ^a   Reuther, F ^a   Fink, M ^a   Gruetzner, G ^a   Carlberg, P ^b   Maximov, I ^b   Montelius, L ^b   Seekamp, J ^c   Zankovych, S ^c   Sotomayor Torres, C M ^c   Schulz, H ^c   Scheer, H C ^c  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b LUND UNIVERSITY   (Sweden)

^c UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Chemically amplified resist; Cross linked polymers; Nanoimprint lithography

Indexed keywords

CROSSLINKING; GLASS TRANSITION; LITHOGRAPHY; POLYMERIZATION; THERMODYNAMIC STABILITY;

NANOIMPRINTING;

POLYMERS;

EID: 0038697349     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00079-0     Document Type: Conference Paper

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