Investigation of application availability of UV-NIL by using several types of photo-curable resin

Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 531-536

  Sakai, Nobuji ^a   Taniguchi, Jun ^b   Kawaguchi, Kenshi ^b   Ohtaguchi, Makoto ^a   Hirasawa, Tamano ^a  

^a TOYO GOSEI CO LTD   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Adhesive Force; Glass transition temperature; Mold; Photo curable resin; UV nanoimprint

Indexed keywords

EID: 22144480278     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.531     Document Type: Article

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