Vinyl ether formulations for step and flash imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2967-2971

  Kim, E K ^a   Stewart, M D ^a   Wu, K ^a   Palmieri, F L ^a   Dickey, M D ^a   Ekerdt, J G ^a   Willson, C G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURING RATES; FLASH IMPRINT LITHOGRAPHY; PATTERNING MONOMERS; VINYL ETHER;

CURING; LITHOGRAPHY; MONOMERS; SILICON; TENSILE STRENGTH; VAPOR PRESSURE; VISCOSITY;

ETHERS;

EID: 29044440657     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2131881     Document Type: Article

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