Polymer time constants during low temperature nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2963-2966

  Scheer, H C ^a   Bogdanski, N ^a   Wissen, M ^a   Konishi, T ^b   Hirai, Y ^b  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS TRANSITION; LITHOGRAPHY; LOW TEMPERATURE EFFECTS; NANOTECHNOLOGY; VISCOELASTICITY; VISCOSITY;

IMPRINT VELOCITY; NANOIMPRINT LITHOGRAPHY; PATTERN SIZE EFFECTS; SHEAR RATE EFFECTS;

POLYMERS;

EID: 29044438113     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2121727     Document Type: Article

References (12)

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