Study of the kinetics of step and flash imprint lithography photopolymerization

AIChE Journal

Volumn 51, Issue 9, 2005, Pages 2547-2555

  Dickey, Michael D ^a   Burns, Ryan L ^a   Kim, E K ^a   Johnson, Steve C ^a   Stacey, Nick A ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Nanoimprint lithography; Photopolymerization; Reaction kinetics

Indexed keywords

ACRYLATE-BASED FREE RADICAL POLYMERIZATION; OXYGEN DIFFUSION; OXYGEN INHIBITION; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

ACRYLIC MONOMERS; COST EFFECTIVENESS; ENZYME INHIBITION; FREE RADICAL POLYMERIZATION; OXYGEN; PHOTOPOLYMERIZATION;

LITHOGRAPHY;

KINETICS; POLYMERIZATION;

EID: 26944465388     PISSN: 00011541     EISSN: None     Source Type: Journal    
DOI: 10.1002/aic.10477     Document Type: Conference Paper

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