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Advanced Materials

Volumn 17, Issue 11, 2005, Pages 1419-1424

Room-temperature, low-pressure nanoimprinting based on cationic photopolymerization of novel epoxysilicone monomers

(3) Cheng, Xing a Guo, L Jay a Fu, Peng Fei b

a UNIVERSITY OF MICHIGAN (United States)

b DOW CORNING CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATIONIC POLYMERIZATION; DRY ETCHING; LITHOGRAPHY; NANOTECHNOLOGY; PHOTOPOLYMERIZATION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICONES; SPIN COATING; VISCOSITY;

EPOXYSILICONES; FILM RESISTANCE; PHOTOACID GENERATOR (PAG); UV-ASSISTED NANOIMPRINT LITHOGRAPHY;

MONOMERS;

EID: 20444475369 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200401192 Document Type: Article

Times cited : (89)

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