Fabrication of molecular-electronic circuits by nanoimprint lithography at low temperatures and pressures

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 8, 2004, Pages 1169-1173

  Jung, G Y ^a   Ganapathiappan, S ^a   Li, X ^a   Ohlberg, D A A ^a   Olynick, D L ^b   Chen, Y ^a   Tong, W M ^a,c   Williams, R S ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ELECTRONIC STRUCTURE; LITHOGRAPHY; NETWORKS (CIRCUITS); POLYMETHYL METHACRYLATES; SPIN COATING; SYNTHESIS (CHEMICAL);

HIGH QUALITY PATTERN TRANSFER; SPIN COATED FILMS;

NANOTECHNOLOGY;

EID: 1842534439     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2393-0     Document Type: Article

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