Sub-100 nm Patterning with an Amorphous Fluoropolymer Mold

Langmuir

Volumn 20, Issue 6, 2004, Pages 2445-2448

  Khang, Dahl Young ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CURING; ELASTOMERS; INTERFACIAL ENERGY; MECHANICAL PERMEABILITY; ORGANIC SOLVENTS; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; STIFFNESS; SURFACE TENSION; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

FLUOROPOLYMER MOLDS; PHOTOCURING;

FLUORINE CONTAINING POLYMERS;

POLYMERS; SURFACE ENERGY;

EID: 1842477459     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0358668     Document Type: Article

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24. In principle, the solvent permeation-induced dimensional change of the mold may be possible. We could not observe, however, any measurable dimensional change of the mold (or patterns on polymeric layer) from the repeated use of the mold with the polymer solution (Route I, II), when observed by SEM and AFM. Also, the pore plugging by the UV-curable pre-polymer (Route III) could not be observed. These may be due to the high mechanical strength and a very small (∼1 nm) pore size of the mold material.
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28. 2/Si master mold that was used for the replication of amorphous Teflon mold, as confirmed from separate SEM and AFM measurements (not shown here).
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