Step and flash imprint lithography: A new approach to high-resolution patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 379-389

  Colburn, M ^a   Johnson, S ^a   Stewart, M ^a   Damle, S ^a   Bailey, T ^a   Choi, B ^a   Wedlake, M ^a   Michaelson, T ^a   Sreenivasan, S V ^a   Ekerdt, J ^a   Willson, C G ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; IMAGE ANALYSIS; IMAGE QUALITY; MASKS; PHOTOPOLYMERIZATION; REACTIVE ION ETCHING; SUBSTRATES;

FLASH IMPRINT LITHOGRAPHY; HIGH-RESOLUTION PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0032625408     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351155     Document Type: Conference Paper

References (14)