Three-dimensional polymer structures fabricated by reversal ultraviolet-curing imprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2954-2957

  Kehagias, N ^a   Zelsmann, M ^a   Torres, C M Sotomayor ^a   Pfeiffer, K ^b   Ahrens, G ^b   Gruetzner, G ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; OPTICAL DEVICES; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICES; THREE DIMENSIONAL; ULTRAVIOLET RADIATION;

FABRICATION PROCESSES; LAYER-BY-LAYER FABRICATION; REVERSAL IMPRINT TECHNIQUES; THREE-DIMENSIONAL POLYMER STRUCTURES;

POLYMERS;

EID: 29044433204     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2130349     Document Type: Article

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