One-step lithography for various size patterns with a hybrid mask-mold

Microelectronic Engineering

Volumn 71, Issue 3-4, 2004, Pages 288-293

  Cheng, Xing ^a   Guo, L Jay ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Hybrid mask mold; Nanofabrication; Nanoimprint; Nanolithography

Indexed keywords

MASKS; MOLDING; NANOTECHNOLOGY; SUBSTRATES; THERMOPLASTICS; ULTRAVIOLET RADIATION; VISCOSITY;

HYBRID MASK MOLDS; NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 1842791217     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.01.042     Document Type: Article

References (13)

1. Chou S.Y., Krauss P.R., Renstrom P.J. Appl. Phys. Lett. 67:1995;3114.
2. Chou S.Y., Krauss P.R., Renstrom P.J. Science. 272:1996;85.
3. Chou S.Y., Krauss P.R., Zhang W., Guo L., Zhuang L. J. Vac. Sci. Technol. B. 15:1997;2897.
4. Schift H., Heyderman L.J., Auf der Maur M., Gobrecht J. Nanotechnology. 12:2001;173.
5. Heyderman L.J., Schift H., David C., Gobrecht J., Schweizer T. Microelectron. Eng. 54:2000;229.
6. Otto M., Bender M., Hadam B., Spangenberg B., Kurz H. Microelectron. Eng. 57-58:2001;361.
7. Scheer H.-C., Schulz H., Hoffmann T., Sotomayor Torres C.M. J. Vac. Sci. Technol. B. 16:1998;3917.
8. Scheer H.-C., Schulz H. Microelectron. Eng. 56:2001;311.
9. Pfeiffer K., Fink M., Gruetzner G., Bleidiessel G., Schulz H., Scheer H. Microelectron. Eng. 57-58:2001;381.
10. Montelius L., Heidari B., Graczyk M., Maximov I., Sarwe E.-L., Ling T.G.I. Microelectron. Eng. 53:2000;521.
11. L. Guerin, M. Bossel, M. Demierre, S. Calmes, P. Renaud, Proc. Transducers, Chicago (1997).
12. X. Cheng, L.J. Guo, Microelectron. Eng. (2004), this issue.
13. Colburn M., Johnson S., Stewart M., Damle S., Bailey T., Choi B., Wedlake M., Michaelson T., Sreenivasan S.V., Ekerdt J., Willson C.G. Proc. SPIE. 3676:1999;379.