SCOPUS 정보 검색 플랫폼

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 1, 2005, Pages 1-6

Nanofabrication with step and flash imprint lithography

(5) Stewart, Michael D a,b Johnson, Stephen C a Sreenivasan, S V b Resnick, Douglas J c Grant Willson, C a

a The University of Texas at Austin (United States)

b MOLECULAR IMPRINTS INC (United States)

c MOTOROLA INC (United States)

Author keywords

Imprint lithography; Nanoimprint; Step and flash imprint lithography

Indexed keywords

IMPRINT LITHOGRAPHY; NANOIMPRINTS; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL); TEMPLATE FABRICATION;

INTEGRATED CIRCUITS; MICROELECTROMECHANICAL DEVICES; MULTILAYERS; NANOTECHNOLOGY; OPTOELECTRONIC DEVICES; PRINTING; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

LITHOGRAPHY; MULTILAYERS; POLLUTION; PRINTED CIRCUITS; PRINTING; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

EID: 24144432962 PISSN: 15371646 EISSN: None Source Type: Journal
DOI: 10.1117/1.1862650 Document Type: Article

Times cited : (74)

References (22)

1
- 84861242485
- See http://public.itrs.net/Files/2003ITRS/Home2003.htm.

2
- 0032625408
- Step and flash imprint lithography: A new approach to highresolution patterning
- M. Colbum, S. Johnson, M. Stewart, S. Damle, T. C. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, "Step and flash imprint lithography: a new approach to highresolution patterning," in Proc. SPIE 3676, 379-389 (1999).
- (1999) Proc. SPIE , vol.3676 , pp. 379-389
- Colbum, M.¹ Johnson, S.² Stewart, M.³ Damle, S.⁴ Bailey, T.C.⁵ Choi, B.⁶ Wedlake, M.⁷ Michaelson, T.⁸ Sreenivasan, S.V.⁹ Ekerdt, J.¹⁰ Willson, C.G.¹¹

3
- 0141724812
- Design and performance of a step and repeat imprinting machine
- I. McMackin, P. Schumaker, D. Babbs, J. Choi, W. Collison, S. V. Sreenivasan, N. E. Schumaker, M. P. C. Watts, and R. D. Voisin, "Design and performance of a step and repeat imprinting machine," in Proc. SPIE 5037, 178-186 (2003).
- (2003) Proc. SPIE , vol.5037 , pp. 178-186
- McMackin, I.¹ Schumaker, P.² Babbs, D.³ Choi, J.⁴ Collison, W.⁵ Sreenivasan, S.V.⁶ Schumaker, N.E.⁷ Watts, M.P.C.⁸ Voisin, R.D.⁹

4
- 5344268855
- J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B 14, 4124 (1996).
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 4124
- Haisma, J.¹ Verheijen, M.² Van Den Heuvel, K.³ Van Den Berg, J.⁴

5
- 5344241941
- S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 4129
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

6
- 8944257381
- Y. Xia, E. Kim, X. M. Zhao, J. A. Rogers, M. Premiss, and G. M. Whitesides, Science 273, 347 (1996).
- (1996) Science , vol.273 , pp. 347
- Xia, Y.¹ Kim, E.² Zhao, X.M.³ Rogers, J.A.⁴ Premiss, M.⁵ Whitesides, G.M.⁶

7
- 0030263409
- X. M. Zhao, Y. Xia, and G. M. Whitesides, Adv. Mater. (Weinheim, Ger.) 8, 837 (1996).
- (1996) Adv. Mater. (Weinheim, Ger.) , vol.8 , pp. 837
- Zhao, X.M.¹ Xia, Y.² Whitesides, G.M.³

8
- 0033698147
- Step and flash imprint lithography for sub-100-nm interdigitated metal arrays
- M. Colbum, A. Grot, M. N. Amistoso, B. J. Choi, T. C. Bailey, J. G. Ekerdt, S. V. Sreenivasan, J. Hollenhorst, and C. G. Willson, "Step and flash imprint lithography for sub-100-nm interdigitated metal arrays," in Proc. SPIE 3997, 453-457 (2000).
- (2000) Proc. SPIE , vol.3997 , pp. 453-457
- Colbum, M.¹ Grot, A.² Amistoso, M.N.³ Choi, B.J.⁴ Bailey, T.C.⁵ Ekerdt, J.G.⁶ Sreenivasan, S.V.⁷ Hollenhorst, J.⁸ Willson, C.G.⁹

9
- 0035902004
- D. Y. Khang, H. Yoon, and H. H. Lee, Adv. Mater. (Weinheim, Ger.) 13, 749 (2001).
- (2001) Adv. Mater. (Weinheim, Ger.) , vol.13 , pp. 749
- Khang, D.Y.¹ Yoon, H.² Lee, H.H.³

10
- 0141674950
- M. C. McAlpine, R. S. Friedman, and C. M. Lieber, Nano Lett. 3, 443 (2003).
- (2003) Nano Lett. , vol.3 , pp. 443
- McAlpine, M.C.¹ Friedman, R.S.² Lieber, C.M.³

11
- 33645620770
- PhD Dissertation, The Univ. Texas at Austin
- M. E. Colburn, PhD Dissertation, The Univ. Texas at Austin (2001).
- (2001)
- Colburn, M.E.¹

12
- 0035450409
- M. Otto, M. Bender, B. Hadam, B. Spangenberg, and H. Kurz, Microelectron. Eng. 57, 58, 361 (2001).
- (2001) Microelectron. Eng. , vol.57-58 , pp. 361
- Otto, M.¹ Bender, M.² Hadam, B.³ Spangenberg, B.⁴ Kurz, H.⁵

13
- 4344692571
- M. Colburn, B. J. Choi, S. V. Sreenivasan, C. G. Willson, and R. T. Bonnecaze, Microelectron. Eng. 75, 321 (2004).
- (2004) Microelectron. Eng. , vol.75 , pp. 321
- Colburn, M.¹ Choi, B.J.² Sreenivasan, S.V.³ Willson, C.G.⁴ Bonnecaze, R.T.⁵

14
- 0141791624
- D. J. Resnick, D. Mancini, W. J. Dauksher, K. Nordquist, T. C. Bailey, S. Johnson, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, Microelectron. Eng. 69, 412 (2003).
- (2003) Microelectron. Eng. , vol.69 , pp. 412
- Resnick, D.J.¹ Mancini, D.² Dauksher, W.J.³ Nordquist, K.⁴ Bailey, T.C.⁵ Johnson, S.⁶ Sreenivasan, S.V.⁷ Ekerdt, J.G.⁸ Willson, C.G.⁹

15
- 0012752163
- S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, J. Vac. Sci. Technol. B 15, 2897 (1997).
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2897
- Chou, S.Y.¹ Krauss, P.R.² Zhang, W.³ Guo, L.⁴ Zhuang, L.⁵

16
- 0347902948
- H. C. Scheer, H. Schulz, T. Hoffmann, and C. M. Sotomayor Torres, J. Vac. Sci. Technol. B 16, 3917 (1998).
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3917
- Scheer, H.C.¹ Schulz, H.² Hoffmann, T.³ Sotomayor Torres, C.M.⁴

17
- 0035422490
- H. C. Scheer and H. Schulz, Microelectron. Eng. 56, 311 (2001).
- (2001) Microelectron. Eng. , vol.56 , pp. 311
- Scheer, H.C.¹ Schulz, H.²

18
- 3843056766
- Development of imprint materials for the step and flash imprint lithography process
- F. Xu, N. Stacey, M. Watts, V. Trusket, I. McMackin, J. Choi, P. Schumaker, E. Thompson, D. Babbs, S. V. Sreenivasan, C. G. Willson, and N. Schumaker, "Development of imprint materials for the step and flash imprint lithography process," in Proc. SPIE 5374, 232-241 (2004).
- (2004) Proc. SPIE , vol.5374 , pp. 232-241
- Xu, F.¹ Stacey, N.² Watts, M.³ Trusket, V.⁴ McMackin, I.⁵ Choi, J.⁶ Schumaker, P.⁷ Thompson, E.⁸ Babbs, D.⁹ Sreenivasan, S.V.¹⁰ Willson, C.G.¹¹ Schumaker, N.¹²

19
- 0038020953
- S. Johnson, D. J. Resnick, D. Mancini, K. Nordquist, W. J. Dauksher, K. Gehoski, J. H. Baker, L. Dues, A. Hooper, T. C. Bailey, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Microelectron. Eng. 67, 68, 221 (2003).
- (2003) Microelectron. Eng. , vol.67-68 , pp. 221
- Johnson, S.¹ Resnick, D.J.² Mancini, D.³ Nordquist, K.⁴ Dauksher, W.J.⁵ Gehoski, K.⁶ Baker, J.H.⁷ Dues, L.⁸ Hooper, A.⁹ Bailey, T.C.¹⁰ Sreenivasan, S.V.¹¹ Ekerdt, J.¹² Willson, C.G.¹³

20
- 33645617755
- submitted for publication
- B. J. Choi et al., "Distortion and overlay performance of UV step and repeat imprint lithography," (submitted for publication).
- Distortion and Overlay Performance of UV Step and Repeat Imprint Lithography
- Choi, B.J.¹

21
- 0035519809
- T. C. Bailey, B. J. Smith, B. J. Choi, M. E. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, J. Vac. Sci. Technol. B 19, 2806 (2001).
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 2806
- Bailey, T.C.¹ Smith, B.J.² Choi, B.J.³ Colburn, M.E.⁴ Meissl, M.⁵ Sreenivasan, S.V.⁶ Ekerdt, J.G.⁷ Willson, C.G.⁸

22
- 21144464013
- Inspection and repair issues for step and flash imprint lithography templates
- K. J. Nordquist et al., "Inspection and repair issues for step and flash imprint lithography templates," Proc. SPIE 5567, 853-863 (2004).
- (2004) Proc. SPIE , vol.5567 , pp. 853-863
- Nordquist, K.J.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.