Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2920-2924

  Tormen, Massimo ^a   Carpentiero, Alessandro ^a   Vaccari, Lisa ^b   Altissimo, Matteo ^a,e   Ferrari, Enrico ^a,c   Cojoc, Dan ^a   Di Fabrizio, Enzo ^a,d  

^a LABORATORIO TASC   (Italy)

^b SINCROTRONE TRIESTE   (Italy)

^c UNIVERSITY OF TRIESTE   (Italy)

^d University Magna Groecia   (Italy)

^e CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EMBOSSING TECHNIQUES; NANOIMPRINT LITHOGRAPHY (NIL); THREE-DIMENSIONAL (3D) STRUCTURING; TWO-DIMENSIONAL PATTERNING TECHNIQUES;

ATOMIC FORCE MICROSCOPY; ETCHING; LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; QUARTZ; THREE DIMENSIONAL; THROUGHPUT;

STAMPING;

EID: 29044438817     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2130348     Document Type: Article

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