A hybrid mask-mould lithography scheme and its application in nanoscale organic thin film transistors

Nanotechnology

Volumn 17, Issue 4, 2006, Pages 927-932

  Cheng, Xing ^a,b   Li, Dawen ^a   Guo, L Jay ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; ELECTROCHEMICAL ELECTRODES; FABRICATION; NANOSTRUCTURED MATERIALS; THIN FILM TRANSISTORS;

INDUSTRIAL DEVELOPMENTS; MOULDING; NANOIMPRINT LITHOGRAPHY (NIL); ORGANIC THIN FILM TRANSISTORS (OTFT);

LITHOGRAPHY;

EID: 31944432273     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/4/015     Document Type: Article

References (19)

1. Owa S, Nagasaka H, Ishii Y, Hirakawa O and Yamamoto T 2004 Feasibility of immersion lithography Optical Microlithography vol XVII (Santa Clara, CA: SPIE)
2. Chou S Y, Krauss P R and Renstrom P J 1995 Imprint of sub-25 nm vias and trenches in polymers Appl. Phys. Lett. 67 3114-6
3. Chou S Y, Krauss P R and Renstrom P J 1996 Imprint lithography with 25-nanometer resolution Science 272 85-7
4. Chou S Y, Krauss P R, Zhang W, Guo L and Zhuang L 1997 Sub-10 nm inprint lithography and applications J. Vac. Sci. Technol. B 15 2897-904
5. Heyderman L J, Schift H, David C, Gobrecht J and Schweizer T 2000 Flow behaviour of thin polymer films used for hot embossing lithography Microelectron. Eng. 54 229-45
6. Otto M, Bender M, Hadam B, Spangenberg B and Kurz H 2001 Characterization and application of a UV-based imprint technique Microelectron. Eng. 57/58 361-6
7. Scheer H-C and Schulz H 2001 A contribution to the flow behaviour of thin polymer films during hot embossing lithography Microelectron. Eng. 56 311-32
8. Scheer H-C, Schulz H, Hoffmann T and Sotomayor Torres C M 1998 Problems of the nanoimprinting technique for nanometer scale pattern definition J. Vac. Sci. Technol. B 16 3917-21
9. Schift H, Heyderman L J, Auf der Maur M and Gobrecht J 2001 Pattern formation in hot embossing of thin polymer films Nanotechnology 12 173-7
10. Stewart M D, Johnson S C, Sreenivasan S V, Resnick D J and Willson C G 2005 Nanofabrication with step and flash imprint lithography J. Microlith. Microfab. Microsyst. 4 011002-6
11. McMackin I, Choi J, Schumaker P, Nguyen V, Xu F, Thompson E, Babbs D, Sreenivasan S V, Watts M and Schumaker N 2004 Step and repeat UV nanoimprint lithography tools and processes Emerging Lithographic Technologies vol VIII (Santa Clara, CA: SPIE)
12. Cheng X, Chang M-H and Guo L J 2004 Combined nanoimprint and photolithography technique with a hybrid mold Emerging Lithographic Technologies vol VIII (Santa Clara, CA: SPIE)
13. Beck M, Graczyk M, Maximov I, Sarwe E-L, Ling T G I, Keil M and Montelius L 2002 Improving stamps for 10 nm level wafer scale nanoimprint lithography Microelectron. Eng. 61/62 441-8
14. Chen Y, Lebib A, Li S, Pepin A, Peyrade D, Natali M and Cambril E 2000 Nanoimprint and micro-contact printing tri-layer processes Eur. Phys. 12 223-9
15. Lebib A, Chen Y, Carcenac F, Cambril E, Manin L, Couraud L and Launois H 2000 Tri-layer systems for nanoimprint lithography with an improved process latitude Microelectron. Eng. 53 175-8
16. Li D and Guo L J 2006 Micron-scale organic thin film transistors with PEDOT electrodes patterned by polymer inking Appl. Phys. Lett. 88 at press
17. Dimitrakopoulos D and Malenfant R L 2002 Organic thin film transistors for large area electronics Adv. Mater. 14 99-117
18. Zhang Y, Petta J R, Ambily S, Shen Y, Ralph D C and Malliaras G G 2003 30 nm channel length pentacene transistors Adv. Mater. 15 1632-5
19. Cheng X, Guo L J and Fu P-F 2005 Room-temperature, low-pressure nanoimprinting based on cationic photopolymerization of novel epoxysilicone monomers Adv. Mater. 17 1419-24