Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1874-1877

  Ahn, Seh Won ^a   Lee, Ki Dong ^a   Kim, Jin Sung ^a   Kim, Sang Hoon ^a   Park, Joo Do ^a   Lee, Sarng Hoon ^a   Yoon, Phil Won ^a  

^a LG Electronics Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COST EFFECTIVENESS; ELECTRON BEAMS; ETCHING; FABRICATION; LASER APPLICATIONS; NANOTECHNOLOGY; POLARIZATION;

NANOIMPRINT LITHOGRAPHY (NIL); POLARIZATION EXTINCTION RATIO (PER); REACTIVE-ION ETCHING (RIE); WIRE GRID POLARIZERS (WGP);

LITHOGRAPHY;

EID: 23444436105     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/076     Document Type: Review

References (8)

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8. http://www.gsolver.com