Kinetic parameters for Step and Flash Imprint Lithography photopolymerization

AIChE Journal

Volumn 52, Issue 2, 2006, Pages 777-784

  Dickey, Michael D ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Free radical rate coefficients; Nanoimprint lithography; Photopolymerization; Reaction kinetics

Indexed keywords

FREE-RADICAL RATE COEFFICIENTS; NANOIMPRINT LITHOGRAPHY; NANOPATTERNING TECHNIQUE; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

CONVOLUTION; IRRADIATION; LITHOGRAPHY; NANOTECHNOLOGY; PATTERNMAKING; REACTION KINETICS; SPECTRUM ANALYSIS;

PHOTOPOLYMERIZATION;

CONVOLUTION; IRRADIATION; LITHOGRAPHY; NANOTECHNOLOGY; PATTERNMAKING; PHOTOPOLYMERIZATION; REACTION KINETICS; SPECTRUM ANALYSIS;

EID: 32444439313     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.10666     Document Type: Article

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