Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography

Langmuir

Volumn 21, Issue 4, 2005, Pages 1158-1161

  Jung, Gun Young ^a   Li, Zhiyong ^a   Wu, Wei ^a   Chen, Yong ^b   Olynick, Deirdre L ^c   Wang, Shih Yuan ^a   Tong, William M ^d   Williams, R Stanley ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE ANALYSIS; NANOIMPRINT LITHOGRAPHY (NIL); ORGANOSILANES; REFLECTION-ABSORPTION INFRARED SPECTROSCOPY (RAIRS);

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; ELLIPSOMETRY; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MOLD RELEASE AGENTS; THIN FILMS;

SELF ASSEMBLY;

EID: 14044274934     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0476938     Document Type: Article

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