Study of the resist deformation in nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2811-2815

  Hirai, Yoshihiko ^a   Fujiwara, Masaki ^a   Okuno, Takahiro ^a   Tanaka, Yoshio ^a   Endo, Masataka ^b   Irie, Sigeo ^b   Nakagawa, Kazuo ^b   Sasago, Masaru ^b  

^a Osaka Prefecture University   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; ELASTICITY; FINITE ELEMENT METHOD; GLASS TRANSITION; MOLDS; NANOTECHNOLOGY; ORGANIC POLYMERS; PRESSURE EFFECTS; RUBBER; TEMPERATURE; THIN FILMS;

GROOVE; MOONY RIVLIN MODEL; RESIST DEFORMATION; RUBBER ELASTIC MODEL; THIN POLYMER FILM;

PHOTORESISTS;

EID: 0035519113     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1415510     Document Type: Article

References (11)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995).
2. M. Colburn et al., Proc. SPIE 3676, 378 (1999).
3. http://msc.visualnastran.com/products/.
4. M. Moony, J. Appl. Phys. 11, 582 (1940).
5. R. S. Rivin, Philos. Trans. R. Soc. London, Ser. A 242, 173 (1949).
6. User Information A, MARC Analysis Research Corporation, Palo Alto, CA (1994).
7. L. E. Nielsen, Soc. Plastic Eng. J. 16, 525 (1960).
8. N. A. Fleck, W. J. Strange, and J. H. Liu, Proc. R. Soc. London, Ser. A 429, 459 (1990).
9. F. Hurtado-Laguna and J. V. Aleman, J. Polym. Sci., Part A: Polym. Chem. 26, 2631 (1988).
10. Y. Hirai, T. Kanemaki, M. Fujuwara, T. Yostuya, and Y. Tanaka, J. Photopolym. Sci. Technol. 13, 435 (2000).
11. Y. Hirai, S. Yoshida, A. Okamoto, Y. Tanaka, M. Endo, S. Irie, H. Nakagawa, and M. Sasago, J. Photopolym. Sci. Technol. 14, 457 (2001).