Bilayer reversal imprint lithography: Direct metal-polymer transfer

Nanotechnology

Volumn 15, Issue 8, 2004, Pages 1103-1107

  Suh, Dongchul ^a   Rhee, Jungsoo ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; PHOTOLITHOGRAPHY; POLYMERS; PRESSURE EFFECTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; THERMAL EFFECTS; TRANSPORT PROPERTIES;

HIGH DENSITY INTEGRATION; IMPRINT LITHOGRAPHY; METAL-POLYMER BILAYERS; PATTERN FIDELITY;

MONOLAYERS;

EID: 4344667519     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/8/040     Document Type: Article

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