SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 13, Issue 10, 2001, Pages 749-752

Room-temperature imprint lithography

(3) Khang, D Y a Yoon, H a Lee, H H a

a Seoul National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; HIGH TEMPERATURE OPERATIONS; INTEGRATED CIRCUIT MANUFACTURE; NANOSTRUCTURED MATERIALS; NUMERICAL METHODS; PHOTORESISTS; PLASTIC FLOW; REACTIVE ION ETCHING;

HOT EMOBOSSING LITHOGRAPHY; NAON IMPRINT LITHOGRAPHY; ROOM TEMPERATURE IMPRINTING;

PHOTOLITHOGRAPHY;

EID: 0035902004 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7 Document Type: Article

Times cited : (108)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.