Scanning probe arrays for nanoscale imaging, sensing, and modification

Nanofabrication: Fundamentals and Applications

Volumn , Issue , 2008, Pages 65-126

  Santschi, Christian ^a   Polesel Maris, JerôMe ^a   Brugger, Jürgen ^b   Heinzelmann, Harry ^a  

^a CSEM   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

> Walker; Actuation; Antibody; Atomic Force Microscopy (AFM); Atomic resolution; Block copolymer; Bragg grating; Carbon Nano Tubes (CNT); Contact mode; Diamond; Dielectric; Doping; Dry etch; Electrochemical sensing; Electronic noise; External sensing; Ferroelectric; Flicker noise; Focused electron beam (FEB); Focused Ion Beam (FIB); Force distance curves (FDC); Glycerol; Heterodyne; Homodyne; Interferometry; Magnetostrictive; Microfluidic channel; Millipede; MOSFET; Mould; Multi Wall Carbon Nano Tubes (MWCNT); Noise; Optical path difference; Oxidation sharpening; Piezoelectric effect; Piezoresistive coefficient; Piezoresistive effect; Polymer; Potassium hydroxide KOH; Replication; Resonance frequency; Sacrificial layer; Scanning Electrochemical Microscopy (SECM); Scanning Probe Methods (SPM); Scanning Thermal Microscopy (SThM); Scanning Tunnelling Microscopy (STM); Self sensing; Self Assembled Monolayer (SAM); Sensitivity; Silicon nitrate SixNy; Silicon oxide (SiO2); Single Wall Carbon Nano Tubes (SWCNT); Spectral density; Stress; Tapping mode; Thermal noise; Thermal sensing; Tip surface interaction; Tomographic imaging; Topographical imaging; Voltammetry; Wave guide; Wet etch

Indexed keywords

ANTIBODIES; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; BRAGG GRATINGS; CARBON NANOTUBES; DIAMONDS; DIELECTRIC MATERIALS; DIGITAL STORAGE; DOPING (ADDITIVES); DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTRON WAVE TUBES; FERROELECTRIC MATERIALS; FOCUSED ION BEAMS; GLYCEROL; HETERODYNING; INTERFEROMETRY; ION BEAMS; MOLDS; MOSFET DEVICES; NANOTUBES; PIEZOELECTRICITY; POLYMERS; POTASH; POTASSIUM HYDROXIDE; SCANNING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SILICA; SILICON OXIDES; SINGLE-WALLED CARBON NANOTUBES (SWCN); SPECTRAL DENSITY; STATIC RANDOM ACCESS STORAGE; STRESSES; THERMAL NOISE; VOLTAMMETRY; WET ETCHING;

ACTUATION; ATOMIC RESOLUTION; CONTACT MODES; ELECTROCHEMICAL SENSING; ELECTRONIC NOISE; EXTERNAL SENSING; FLICKER NOISE; FOCUSED ELECTRON BEAMS; FORCE-DISTANCE CURVES; HOMODYNES; MAGNETOSTRICTIVE; MICROFLUIDIC CHANNEL; MILLIPEDE; MOS-FET; NOISE; OPTICAL PATH DIFFERENCE; PIEZORESISTIVE COEFFICIENTS; PIEZORESISTIVE EFFECTS; POTASSIUM HYDROXIDE KOH; REPLICATION; RESONANCE FREQUENCIES; SACRIFICIAL LAYER; SCANNING ELECTROCHEMICAL MICROSCOPY; SCANNING PROBES; SCANNING THERMAL MICROSCOPY; SELF-SENSING; SENSITIVITY; TAPPING MODES; THERMAL SENSING; TIP-SURFACE INTERACTION; TOMOGRAPHIC IMAGING; TOPOGRAPHICAL IMAGING;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 84986631085     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1017/9789812790897_0003     Document Type: Chapter

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