Local modification of micellar layers using nanoscale dispensing

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1509-1512

  Meister, André ^a   Krishnamoorthy, Sivashankar ^a   Hinderling, Christian ^a   Pugin, Raphaël ^a   Heinzelmann, Harry ^a  

^a CSEM   (Switzerland)

Author keywords

AFM; Block copolymer; Maskless lithography; Micelles; Nanofluidic; Nanopatterning; Nanostructuring; Self assembly; Self organization

Indexed keywords

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; MICROMETERS; NANOSTRUCTURED MATERIALS; SELF ASSEMBLY; SURFACE PROPERTIES;

MASKLESS LITHOGRAPHY; NANOFLUIDIC; NANOPATTERNING; NANOSTRUCTURING; SELF-ORGANIZATION;

MICELLES;

EID: 33646029420     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.207     Document Type: Article

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