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Volumn 104, Issue 3-4, 2005, Pages 220-225
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Focused ion beam-nanomachined probes for improved electric force microscopy
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Author keywords
Atomic force microscopy; Electric force microscopy; Focused ion beam; Force volume
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CANTILEVER BEAMS;
DEPOSITION;
NANOTECHNOLOGY;
OPTICAL RESOLVING POWER;
PLATINUM;
SILICON;
ELECTRIC FORCE MICROSCOPY;
ELECTRO-SENSITIVITY;
FOCUSED ION BEAMS (FIB);
NANO-ELECTRODES;
ION BEAMS;
NANOPARTICLE;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
COATED PARTICLE;
CONTRAST ENHANCEMENT;
ELECTRIC ACTIVITY;
ELECTRIC CAPACITANCE;
ION CONDUCTANCE;
SCANNING PROBE MICROSCOPY;
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EID: 22144452597
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2005.04.004 Document Type: Article |
Times cited : (25)
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References (15)
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