-
1
-
-
34848919386
-
-
G. Binnig, H. Rohrer, C. Gerber, and E. Weibel, Phys. Rev. Lett. 49, 57 (1982).
-
(1982)
Phys. Rev. Lett.
, vol.49
, pp. 57
-
-
Binnig, G.1
Rohrer, H.2
Gerber, C.3
Weibel, E.4
-
2
-
-
0042041214
-
-
M. Ringger, H. R. Hidber, R. Schlogel, P. Oelhafen, and H. J. Guntherodt, Appl. Phys. Lett. 46, 832 (1985).
-
(1985)
Appl. Phys. Lett.
, vol.46
, pp. 832
-
-
Ringger, M.1
Hidber, H.R.2
Schlogel, R.3
Oelhafen, P.4
Guntherodt, H.J.5
-
3
-
-
0001529023
-
-
U. Staufer, R. Wiesendanger, L. Eng, L. Rosenthaler, H. R. Hidber, and H. J. Guntherodt, Appl. Phys. Lett. 51, 244 (1987).
-
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 244
-
-
Staufer, U.1
Wiesendanger, R.2
Eng, L.3
Rosenthaler, L.4
Hidber, H.R.5
Guntherodt, H.J.6
-
4
-
-
0022784547
-
-
D. Abraham, H. Mamin, E. Ganz, and J. Clarke, IBM J. Res. Dev. 30, 492 (1986).
-
(1986)
IBM J. Res. Dev.
, vol.30
, pp. 492
-
-
Abraham, D.1
Mamin, H.2
Ganz, E.3
Clarke, J.4
-
5
-
-
0342908968
-
-
J. A. Dagata, J. H. Schneir, H. Harary, C. J. Evans, M. T. Postek, and J. Bennett, Appl. Phys. Lett. 56, 2001 (1990).
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 2001
-
-
Dagata, J.A.1
Schneir, J.H.2
Harary, H.3
Evans, C.J.4
Postek, M.T.5
Bennett, J.6
-
6
-
-
0242302428
-
-
A. A. Tseng, K. Chen, C. D. Chen, and K. J. Ma, IEEE Trans. Electronics Packaging Manuf. 26, 141 (2003).
-
(2003)
IEEE Trans. Electronics Packaging Manuf.
, vol.26
, pp. 141
-
-
Tseng, A.A.1
Chen, K.2
Chen, C.D.3
Ma, K.J.4
-
9
-
-
0000653333
-
-
H. U. Muller, C. David, B. Volkel, and M. Grunze, J. Vac. Sci. Technol. B 13, 2846 (1995).
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 2846
-
-
Muller, H.U.1
David, C.2
Volkel, B.3
Grunze, M.4
-
10
-
-
0001629322
-
-
F. K. Perkins, E. A. Dobisz, S. L. Brandow, J. M. Calvert, J. E. Kosakowsky, and C. R. K. Marrian, Appl. Phys. Lett. 68, 550 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 550
-
-
Perkins, F.K.1
Dobisz, E.A.2
Brandow, S.L.3
Calvert, J.M.4
Kosakowsky, J.E.5
Marrian, C.R.K.6
-
13
-
-
0031167308
-
-
W. Xie, X. Dai, L. S. Xu, D. A. Allee, and J. Spector, Nanotechnology 8, 88 (1997).
-
(1997)
Nanotechnology
, vol.8
, pp. 88
-
-
Xie, W.1
Dai, X.2
Xu, L.S.3
Allee, D.A.4
Spector, J.5
-
15
-
-
0036883093
-
-
A. Houel, D. Tonneau, N. Bonnail, H. Dallaporta, and V. I. Safarov, J. Vac. Sci. Technol. B 20, 2337 (2002).
-
(2002)
J. Vac. Sci. Technol. B
, vol.20
, pp. 2337
-
-
Houel, A.1
Tonneau, D.2
Bonnail, N.3
Dallaporta, H.4
Safarov, V.I.5
-
16
-
-
0000928428
-
-
H. J. Mamin, S. Chiang, H. Birk, P. H. Guethner, and D. Rugar, J. Vac. Sci. Technol. B 9, 1398 (1991).
-
(1991)
J. Vac. Sci. Technol. B
, vol.9
, pp. 1398
-
-
Mamin, H.J.1
Chiang, S.2
Birk, H.3
Guethner, P.H.4
Rugar, D.5
-
17
-
-
0141651671
-
-
D. Fujita, K. Onishi, and T. Kumakura, Jpn. J. Appl. Phys., Part 1 42, 4773 (2003).
-
(2003)
Jpn. J. Appl. Phys., Part 1
, vol.42
, pp. 4773
-
-
Fujita, D.1
Onishi, K.2
Kumakura, T.3
-
21
-
-
5844246887
-
-
W. W. Pai, J. Zhang, J. F. Wendelken, and R. J. Warmak, J. Vac. Sci. Technol. B 15, 785 (1997).
-
(1997)
J. Vac. Sci. Technol. B
, vol.15
, pp. 785
-
-
Pai, W.W.1
Zhang, J.2
Wendelken, J.F.3
Warmak, R.J.4
-
23
-
-
0000685465
-
-
J. W. Lyding, G. C. Abeln, T.-C. Shen, C. Wang, and J. R. Tucker, J. Vac. Sci. Technol. B 12, 3735 (1994).
-
(1994)
J. Vac. Sci. Technol. B
, vol.12
, pp. 3735
-
-
Lyding, J.W.1
Abeln, G.C.2
Shen, T.-C.3
Wang, C.4
Tucker, J.R.5
-
26
-
-
0032131288
-
-
N. Li, T. Yoshinobu, and H. Iwasaki, Jpn. J. Appl. Phys., Part 2 37, L995 (1998).
-
(1998)
Jpn. J. Appl. Phys., Part 2
, vol.37
, pp. 995
-
-
Li, N.1
Yoshinobu, T.2
Iwasaki, H.3
-
27
-
-
0000144910
-
-
S. Fujita, S. Maruno, H. Watanabe, and M. Ichikawa, Appl. Phys. Lett. 69, 638 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 638
-
-
Fujita, S.1
Maruno, S.2
Watanabe, H.3
Ichikawa, M.4
-
30
-
-
0029342415
-
-
J. H. Ye, F. Ṕrez-Murano, N. Barniol, G. Abadal, and X. Aymerich, J. Vac. Sci. Technol. B 13, 1423 (1995).
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 1423
-
-
Ye, J.H.1
Ṕrez-Murano, F.2
Barniol, N.3
Abadal, G.4
Aymerich, X.5
-
33
-
-
26744471431
-
-
Y. Z. Li, L. Vazquez, R. Piner, R. P. Andres, and R. Reifenberger, Appl. Phys. Lett. 54, 1424 (1989).
-
(1989)
Appl. Phys. Lett.
, vol.54
, pp. 1424
-
-
Li, Y.Z.1
Vazquez, L.2
Piner, R.3
Andres, R.P.4
Reifenberger, R.5
-
34
-
-
0029324035
-
-
M. Ohto, S. Yamaguchi, and K. Tanaka, Jpn. J. Appl. Phys., Part 2 34, L694 (1995).
-
(1995)
Jpn. J. Appl. Phys., Part 2
, vol.34
, pp. 694
-
-
Ohto, M.1
Yamaguchi, S.2
Tanaka, K.3
-
35
-
-
0040097251
-
-
S. Kondo, S. Heike, M. Lutwyche, and Y. Wada, J. Appl. Phys. 78, 155 (1995).
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 155
-
-
Kondo, S.1
Heike, S.2
Lutwyche, M.3
Wada, Y.4
-
47
-
-
0036029537
-
-
J. A. Stroscio, E. W. Hudson, S. R. Blankenship, R. J. Celotta, and A. P. Fein, Proc. SPIE 4608, 112 (2002).
-
(2002)
Proc. SPIE
, vol.4608
, pp. 112
-
-
Stroscio, J.A.1
Hudson, E.W.2
Blankenship, S.R.3
Celotta, R.J.4
Fein, A.P.5
-
49
-
-
36449008633
-
-
A. Majumdar, P. I. Oden, J. P. Carrejo, L. A. Nagahara, J. J. Graham, and J. Alexander, Appl. Phys. Lett. 61, 2293 (1992).
-
(1992)
Appl. Phys. Lett.
, vol.61
, pp. 2293
-
-
Majumdar, A.1
Oden, P.I.2
Carrejo, J.P.3
Nagahara, L.A.4
Graham, J.J.5
Alexander, J.6
-
50
-
-
0000534196
-
-
K. Wilder, C. F. Quate, D. Adderton, R. Bernstein, and V. Elings, Appl. Phys. Lett. 73, 2527 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 2527
-
-
Wilder, K.1
Quate, C.F.2
Adderton, D.3
Bernstein, R.4
Elings, V.5
-
51
-
-
0033076849
-
-
P. Davidsson, A. Lindell, T. Makela, M. Paalanen, and J. Pekola, Microelectron. Eng. 45, 1 (1999).
-
(1999)
Microelectron. Eng.
, vol.45
, pp. 1
-
-
Davidsson, P.1
Lindell, A.2
Makela, T.3
Paalanen, M.4
Pekola, J.5
-
52
-
-
0032027868
-
-
M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 1581
-
-
Ishibashi, M.1
Heike, S.2
Kajiyama, H.3
Wada, Y.4
Hashizume, T.5
-
53
-
-
36449002590
-
-
S. W. Park, H. T. Soh, C. F. Quate, and S.-I. Park, Appl. Phys. Lett. 16, 2415 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.16
, pp. 2415
-
-
Park, S.W.1
Soh, H.T.2
Quate, C.F.3
Park, S.-I.4
-
54
-
-
0000265406
-
-
T. Shiokawa, Y. Aoyagi, M. Shigeno, and S. Namba, Appl. Phys. Lett. 72, 2481 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 2481
-
-
Shiokawa, T.1
Aoyagi, Y.2
Shigeno, M.3
Namba, S.4
-
56
-
-
20144384406
-
-
P. Vettiger, G. Cross, M. Despont, U. Drechsler, U. Durig, B. Gotsmann, W. Haberle, M. A. Lantz, H. E. Rothuizen, R. Stutz, and G. Binnig, IEEE Trans. Nanotechnol. 1, 39 (2002).
-
(2002)
IEEE Trans. Nanotechnol.
, vol.1
, pp. 39
-
-
Vettiger, P.1
Cross, G.2
Despont, M.3
Drechsler, U.4
Durig, U.5
Gotsmann, B.6
Haberle, W.7
Lantz, M.A.8
Rothuizen, H.E.9
Stutz, R.10
Binnig, G.11
-
57
-
-
4444223952
-
-
H. Pozidis, W. Haberle, D. Wiesmann, U. Drechsler, M. Despont, T. R. Albrecht, and E. Eleftheriou, IEEE Trans. Magn. 40, 2531 (2004).
-
(2004)
IEEE Trans. Magn.
, vol.40
, pp. 2531
-
-
Pozidis, H.1
Haberle, W.2
Wiesmann, D.3
Drechsler, U.4
Despont, M.5
Albrecht, T.R.6
Eleftheriou, E.7
-
58
-
-
0035450324
-
-
R. Nemutudi, N. J. Curson, N. J. Appleyard, D. A. Ritchie, and G. A. C. Jones, Microelectron. Eng. 57-58, 967 (2001).
-
(2001)
Microelectron. Eng.
, vol.57-58
, pp. 967
-
-
Nemutudi, R.1
Curson, N.J.2
Appleyard, N.J.3
Ritchie, D.A.4
Jones, G.A.C.5
-
61
-
-
0037816702
-
-
F. Ṕrez-Murano, K. Birkelund, K. Morimoto, and J. A. Dagata, Appl. Phys. Lett. 75, 199 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 199
-
-
Ṕrez-Murano, F.1
Birkelund, K.2
Morimoto, K.3
Dagata, J.A.4
-
62
-
-
36449007159
-
-
D. Wang, L. Tsau, K. L. Wang, and P. Chow, Appl. Phys. Lett. 67, 1295 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 1295
-
-
Wang, D.1
Tsau, L.2
Wang, K.L.3
Chow, P.4
-
64
-
-
11744357898
-
-
A. Boisen, K. Birkelund, O. Hansen, and F. Grey, J. Vac. Sci. Technol. B 16, 2977 (1998).
-
(1998)
J. Vac. Sci. Technol. B
, vol.16
, pp. 2977
-
-
Boisen, A.1
Birkelund, K.2
Hansen, O.3
Grey, F.4
-
66
-
-
0037022409
-
-
M. Rolandi, C. F. Quate, and H. Dai, Adv. Mater. (Weinheim, Ger.) 14, 191 (2002).
-
(2002)
Adv. Mater. (Weinheim, Ger.)
, vol.14
, pp. 191
-
-
Rolandi, M.1
Quate, C.F.2
Dai, H.3
-
67
-
-
66249133333
-
-
P. Avouris, R. Martel, T. Hertel, and R. L. Sandstrom, Appl. Phys. A: Mater. Sci. Process. 66, S659 (1998).
-
(1998)
Appl. Phys. A: Mater. Sci. Process.
, vol.66
, pp. 659
-
-
Avouris, P.1
Martel, R.2
Hertel, T.3
Sandstrom, R.L.4
-
69
-
-
0000344209
-
-
U. F. Keyser, H. W. Schumacher, U. Zeitler, R. J. Haug, and K. Eberl, Appl. Phys. Lett. 76, 457 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 457
-
-
Keyser, U.F.1
Schumacher, H.W.2
Zeitler, U.3
Haug, R.J.4
Eberl, K.5
-
70
-
-
0000797106
-
-
K. Matsumoto, Y. Gotoh, T. Maeda, J. A. Dagata, and J. S. Harris, Appl. Phys. Lett. 76, 239 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 239
-
-
Matsumoto, K.1
Gotoh, Y.2
Maeda, T.3
Dagata, J.A.4
Harris, J.S.5
-
71
-
-
0003938491
-
-
S. C. Minne, J. D. Adams, G. Yaralioglu, S. R. Manalis, A. Atalar, and C. F. Quate, Appl. Phys. Lett. 73, 1742 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 1742
-
-
Minne, S.C.1
Adams, J.D.2
Yaralioglu, G.3
Manalis, S.R.4
Atalar, A.5
Quate, C.F.6
-
73
-
-
0000101925
-
-
T. C. Chang, C. S. Chang, H. N. Lin, and T. T. Tsong, Appl. Phys. Lett. 67, 903 (1995).
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 903
-
-
Chang, T.C.1
Chang, C.S.2
Lin, H.N.3
Tsong, T.T.4
-
74
-
-
0011608301
-
-
J. Q. Song, C. Z. Li, H. X. He, Y. Chen, L. Wang, and Z. F. Liu, Mol. Cryst. Liq. Cryst. Sci. Technol., Sect. A 294-295, 51 (1997).
-
(1997)
Mol. Cryst. Liq. Cryst. Sci. Technol., Sect. A
, vol.294-295
, pp. 51
-
-
Song, J.Q.1
Li, C.Z.2
He, H.X.3
Chen, Y.4
Wang, L.5
Liu, Z.F.6
-
77
-
-
0347771381
-
-
K. Uosaki, M. Koinuma, N. Sekine, and S. Ye, ACS Symp. Ser. 656, 189 (1997).
-
(1997)
ACS Symp. Ser.
, vol.656
, pp. 189
-
-
Uosaki, K.1
Koinuma, M.2
Sekine, N.3
Ye, S.4
-
79
-
-
9744244924
-
-
M. Lee, R. O'Hayre, F. B. Prinz, and T. M. Gür, Appl. Phys. Lett. 85, 3552 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 3552
-
-
Lee, M.1
O'Hayre, R.2
Prinz, F.B.3
Gür, T.M.4
-
80
-
-
0035357072
-
-
B. M. Kim, Y.-S. Min, N. S. Lee, J. H. Sok, M. K. Kim, S. D. Chae, W. I. Ryu, and H. S. Chae, Jpn. J. Appl. Phys., Part 1 40, 4340 (2001).
-
(2001)
Jpn. J. Appl. Phys., Part 1
, vol.40
, pp. 4340
-
-
Kim, B.M.1
Min, Y.-S.2
Lee, N.S.3
Sok, J.H.4
Kim, M.K.5
Chae, S.D.6
Ryu, W.I.7
Chae, H.S.8
-
83
-
-
0039384158
-
-
R. Rank, H. Brueckl, J. Kretz, I. Moench, and G. Reiss, Vacuum 48, 467 (1997).
-
(1997)
Vacuum
, vol.48
, pp. 467
-
-
Rank, R.1
Brueckl, H.2
Kretz, J.3
Moench, I.4
Reiss, G.5
-
84
-
-
0041968611
-
-
L. Santinacci, T. Djenizian, H. Hildebrand, S. Ecoffey, H. Mokdad, T. Campanella, and P. Schmuki, Electrochim. Acta 48, 3123 (2003).
-
(2003)
Electrochim. Acta
, vol.48
, pp. 3123
-
-
Santinacci, L.1
Djenizian, T.2
Hildebrand, H.3
Ecoffey, S.4
Mokdad, H.5
Campanella, T.6
Schmuki, P.7
-
85
-
-
4344687588
-
-
H. D. F. Filho, M. H. P. Mauricio, C. R. Ponciano, and R. Prioli, Mater. Sci. Eng., B 112, 194 (2004).
-
(2004)
Mater. Sci. Eng., B
, vol.112
, pp. 194
-
-
Filho, H.D.F.1
Mauricio, M.H.P.2
Ponciano, C.R.3
Prioli, R.4
-
86
-
-
0032159759
-
-
S. Hu, A. Hamidi, S. Altmeyer, T. Koster, B. Spangenberg, and H. Kurz, J. Vac. Sci. Technol. B 16, 2822 (1998).
-
(1998)
J. Vac. Sci. Technol. B
, vol.16
, pp. 2822
-
-
Hu, S.1
Hamidi, A.2
Altmeyer, S.3
Koster, T.4
Spangenberg, B.5
Kurz, H.6
-
87
-
-
0033313348
-
-
A. Notargiacomo, V. Foglietti, E. Cianci, G. Capellini, M. Adami, P. Faraci, F. Evangelisti, and C. Nicolini, Nanotechnology 10, 458 (1999).
-
(1999)
Nanotechnology
, vol.10
, pp. 458
-
-
Notargiacomo, A.1
Foglietti, V.2
Cianci, E.3
Capellini, G.4
Adami, M.5
Faraci, P.6
Evangelisti, F.7
Nicolini, C.8
-
89
-
-
1642369687
-
-
M. Muller, T. Fiedler, R. Groger, T. Koch, S. Walheim, C. Obermair, and T. Schimmel, Surf. Interface Anal. 36, 189 (2004).
-
(2004)
Surf. Interface Anal.
, vol.36
, pp. 189
-
-
Muller, M.1
Fiedler, T.2
Groger, R.3
Koch, T.4
Walheim, S.5
Obermair, C.6
Schimmel, T.7
-
91
-
-
1542397225
-
-
J. Michler, R. Gassilloud, P. Gasser, L. Santinacci, and P. Schmukib, Electrochem. Solid-State Lett. 7, A41 (2004).
-
(2004)
Electrochem. Solid-State Lett.
, vol.7
, pp. 41
-
-
Michler, J.1
Gassilloud, R.2
Gasser, P.3
Santinacci, L.4
Schmukib, P.5
-
93
-
-
0033614026
-
-
R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science 283, 661 (1999).
-
(1999)
Science
, vol.283
, pp. 661
-
-
Piner, R.D.1
Zhu, J.2
Xu, F.3
Hong, S.4
Mirkin, C.A.5
-
94
-
-
1242331516
-
-
D. Bullen, S. W. Chung, X. F. Wang, J. Zou, C. A. Mirkin, and C. Liu, Appl. Phys. Lett. 84, 789 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 789
-
-
Bullen, D.1
Chung, S.W.2
Wang, X.F.3
Zou, J.4
Mirkin, C.A.5
Liu, C.6
-
95
-
-
62549131647
-
-
D. S. Ginger, H. Zhang, and C. A. Mirkin, Angew. Chem., Int. Ed. 43, 30 (2004).
-
(2004)
Angew. Chem., Int. Ed.
, vol.43
, pp. 30
-
-
Ginger, D.S.1
Zhang, H.2
Mirkin, C.A.3
|