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Volumn 1, Issue 10, 2005, Pages 940-945

Sub-100 nm, centimeter-scale, parallel dip-pen nanolithography

(7) Salaita, Khalid a Lee, Seung Woo a Wang, Xuefang b Huang, Ling a Dellinger, Timothy M b Liu, Chang b Mirkin, Chad A a

a NORTHWESTERN UNIVERSITY (United States)

b University of Illinois at Urbana Champaign (United States)

Author keywords

Atomic force microscopy; Dip pen nanolithography; Nanostructures; Patterning

Indexed keywords

ATOMIC FORCE MICROSCOPY; INK; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; RAPID PROTOTYPING;

CANTILEVER ARRAYS; DIP-PEN NANOLITHOGRAPHY; MASSIVE PARALLELIZATION; PATTERNING;

NANOTECHNOLOGY;

GOLD; NANOMATERIAL; NANOPARTICLE; SILICON; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMISTRY; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; SURFACE PROPERTY;

ELECTROCHEMISTRY; GOLD; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; SEMICONDUCTORS; SILICON; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 27944484397 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200500202 Document Type: Article

Times cited : (121)

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