Electrically conducting probes with full tungsten cantilever and tip for scanning probe applications

Nanotechnology

Volumn 17, Issue 5, 2006, Pages 1464-1469

  Steen, J A J ^a   Hayakawa, J ^b   Harada, T ^b   Lee, K ^a   Calame, F ^a   Boero, G ^a   Kulik, A J ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CANTILEVER BEAMS; ELECTRIC CONDUCTIVITY; MICROMACHINING; SILICON WAFERS; SPUTTERING; TUNGSTEN;

AFM IMAGING; AFM PROBE; QUALITY FACTOR;

ATOMIC FORCE MICROSCOPY;

EID: 33244460570     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/17/5/050     Document Type: Article

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