Precursor design and reaction mechanisms for the atomic layer deposition of metal films

Coordination Chemistry Reviews

Volumn 257, Issue 23-24, 2013, Pages 3271-3281

  Bernal Ramos, Karla ^a   Saly, Mark J ^b   Chabal, Yves J ^a  

^a The University of Texas at Dallas   (United States)

^b SAFC Hitech   (United Kingdom)

Author keywords

Atomic layer deposition; Metal deposition; Precursor design; Reaction mechanisms

Indexed keywords

EID: 84885477567     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ccr.2013.03.028     Document Type: Review

References (157)

1. Hamalainen J., Hatanpaa T., Puukilainen E., Costelle L., Pilvi T., Ritalaa M., Leskela M. J. Mater. Chem. 2010, 20:7669.
2. Josell D., Bonevich J.E., Moffat T.P., Aaltonen T., Ritala M., Leskela M. Electrochem. Solid State Lett. 2006, 9:C48.
3. Zhu Y., Dunn K.A., Kaloyeros A.E. J. Mater. Res. 2007, 22:1292.
4. Kim S.K., Lee S.Y., Lee S.W., Hwang G.W., Hwang C.S., Lee J.W., Jeong J. J. Electrochem. Soc. 2007, 154:D95.
5. Ten Eyck G.A., Senkevich J.J., Tang F., Liu D., Pimanpang S., Karaback T., Wang G.C., Lu T.M., Jeqewski C., Lanford W.A. Chem. Vap. Deposition 2005, 11:60.
6. Kwon O.-K., Kim J.-H., Park H.-S., Kang S.-W. J. Electrochem. Soc. 2004, 151:G109.
7. Solanki R., Pathangey B. Electrochem. Solid State Lett. 2000, 3:479.
8. Kim J.-M., Lee H.-B.-R., Lansalot C., Dussarrat C., Gatineau J., Kim H. Jpn. J. Appl. Phys. 2010, 49:05FA10.
9. Jiang X., Huang H., Prinz F.B., Bent S.F. Chem. Mater. 2008, 20:3897.
10. Hsu I.J., Hansgen D.A., McCandless B.E., Willis B.G., Chen J.G. J. Phys. Chem. C 2011, 115:3709.
11. Senkevich J.J., Tan F., Roger D., Drotar J.T., Jezewski k., Lanford W.A., Wang G.C., Lu T.M. Chem. Vap. Deposition 2003, 9:258.
12. George S.M. Chem. Rev. 2010, 110:111.
13. Knez M., Niesch K., Niinisto L. Adv. Mater. 2007, 19:3425.
14. Mistry K., et al. IEEE Int. 2007, 247. 10.1109/IEDM.2007.4418914.
15. M. Ritala, M. Leskelä, Atomic Layer Deposition. Handbook of Thin Film Materials, San Diego, CA, 2001.
16. Klaus J.W., George S.M. Surf. Sci. 2000, 447:81.
17. Elam J.W., Nelson C.E., Grubbs R.K., George S.M. Surf. Sci. 2001, 479:121.
18. Aaltonen T., Alén P., Ritala M., Leskelä M. Chem. Vap. Deposition 2003, 9:45.
19. Aaltonen T., Ritala M., Sajavaara T., Keinonen J., Leskelä M. Chem. Mater. 2003, 15:1924.
20. Lim B.S., Rahtu A., Gordon R.G. Nat. Mater. 2003, 2:749.
21. Kim H., Rossnagel S.M. J. Vac. Sci. Technol. A 2002, 20:802.
22. Rossnagel S.M., Sherman A., Turner F. J. Vac. Sci. Technol. B 2000, 18:2016.
23. Kim H., Cabral C.J., Lavoie C., Rossnagel S.M. J. Vac. Sci. Technol. B 2002, 20:1321.
24. Lee Y.J., Kang S.-W. J. Vac. Sci. Technol. A 2002, 20:1983.
25. J.G. Speight, Lange's Handbook of Chemistry, New York, NY, 2005 (Chapter 1).
26. Aaltonen T., Rahtu A., Ritala M., Leskela M. Electrochem. Solid State Lett. 2003, 6:C130.
27. Park K.J., Terry D.B., Stewart S.M., Parsons G.N. Langmuir 2007, 23:6106.
28. Shibutami T., Kawano K., Oshima N., Yokoyama S., Funakubo H. Electrochem. Solid State Lett. 2003, 6:C117.
29. Park S.-J., Kim W.-H., Lee H.-B.-R., Maeng W.J., Kim H. Microelectron. Eng. 2008, 85:39.
30. Yim S.S., Lee D.J., Kim K.S., Kim S.H., Yoon T.S., Kim K.B. J. Appl. Phys. 2008, 103:113509.
31. Kim W.H., Park S.J., Kim D.Y., Kim H. J. Korean Phys. Soc. 2009, 55:32.
32. Kanjolia R. Semicond. Int. 2007, 30:32.
33. Papadatos F., Skordas S., Consiglio S., Kaloyeros A.E., Eisenbraun E. Mater. Res. Soc. Symp. Proc. 2003, 745. N3.3.1.
34. Xue Z., Thridandam H., Kaesz H.D., Hicks R.F. Chem. Mater. 1992, 4:162.
35. Elliott S.D. Langmuir 2010, 26:9179.
36. Mackus A.J.M., Leick N., Baker L., Kessels W.M.M. Chem. Mater. 2012, 24:1752.
37. Kwon S.-H., Kwon O.-K., Kim J.-H., Jeong S.-J., Kim S.-W., Kang S.-W. J. Electrochem. Soc. 2007, 154:H773.
38. Kwon O.K., Kwon S.H., Park H.S., Kang S.W. Electrochem. Solid State Lett. 2004, 7:C46.
39. Kwon O.-K., Kwon S.-H., Park H.-S., Kang S.-W. J. Electrochem. Soc. 2004, 151:C753.
40. Kukli K., Ritala M., Kemell M., Leskelä M. J. Electrochem. Soc. 2010, 157:D35.
41. Kukli K., Kemell M., Puukilainen E., Aarik J., Aidla A., Sajavaara T., Laitinen M., Tallarida M., Sundqvist J., Ritala M., Leskelä M. J. Electrochem. Soc. 2011, 158:D158.
42. Kukli K., Aarik J., Aidla A., Jõgi I., Arroval T., Lu J., Sajavaara T., Laitinen M., Kiisler A.-A., Ritala M., Leskelä M., Peck J., Natwora J., Geary J., Spohn R., Meiere S., Thompson D.M. Thin Solid Films 2012, 520:2756.
43. Aaltonen T., Alen P., Ritala M., Leskelä M. Chem. Vap. Deposition 2003, 9:45.
44. Shibutami T., Kawano K., Oshima N., Yokoyama S., Funakubo H. Electrochem. Solid State Lett. 2003, 6:C117.
45. Kawano K., Kosuge H., Oshima N., Funakubo H. Electrochem. Solid State Lett. 2009, 12:D80.
46. Hwang C.S. Mater. Sci. Eng. B 1998, 56:178.
47. Methaapanon R., Geyer S.M., Lee H.-B.-R., Bent S.F. J. Mater. Chem. 2012, 22:25154.
48. Gregorczyk K., Henn-Lecordier L., Gatineau J., Dussarrat C., Rubloff G. Chem. Mater. 2011, 23:2650.
49. Aaltonen T., Ritala M., Tung Y.-L., Chi Y., Arstila K., Meinander K., Leskelä M. J. Mater. Res. 2004, 19:3353.
50. Hamalainen J., Munnik F., Ritala M., Leskelä M. Chem. Mater. 2008, 20:6840.
51. Fang Q., Hodson C., Xu C., Gunn R. Phys. Proc. 2012, 32:551.
52. Lim Y.H., Yoo H., Choi B.H., Lee J.H., Lee H.-N., Lee H.K. Phys. Status Solidi C 2011, 8:891.
53. Choi B.H., Lee J.H., Lee H.K., Kim J.H. Appl. Surf. Sci. 2011, 257:9654.
54. Song S.I., Lee J.H., Choi B.H., Lee H.K., Shin D.C., Lee J.W. Surf. Coat. Technol. 2012, 211:14.
55. Jeong S.J., Shin Y.R., Kwack W.S., Lee H.W., Jeong Y.K., Kim D.I., Kim H.C., Kwon S.H. Surf. Coat. Technol. 2011, 205:5009.
56. Knoops H.C.M., Mackus A.J.M., Donders M.E., Sanden M.C.M.v.d., Notten P.H.L., Kessels W.M.M. Electrochem. Solid State Lett. 2009, 12:G34.
57. Eom T.-K., Sari W., Choi K.-J., Shin W.-C., Kim J.H., Lee D.-J., Kim K.-B., Sohn H., Kim S.-H. Electrochem. Solid State Lett. 2009, 12:D85.
58. Boyd E.P., Ketchum D.R., Deng H., Shore S.G. Chem. Mater. 1997, 9:1154.
59. R.H. Crabtree, The Organometallic Chemistry of the Transition Metals, Hoboken, NJ, 2005.
60. Jeong S.-J., Shin Y.-R., Kwack W.-S., Lee H.W., Jeong Y.-K., Kim D.-I., Kim H.C., Kwon S.-H. Surf. Coat. Technol. 2011, 205:5009.
61. Kanjolia R.K., Anthis J., Odedra R., Williams P., Heys P.N. ECS Trans. 2008, 16:79.
62. Park S.K., Kanjolia R., Anthis J., Odedra R., Boag N., Wielunski L., Chabal Y.J. Chem. Mater. 2010, 22:4867.
63. Wang H., Gordon R.G., Alvis R., Ulfig R.M. Chem. Vap. Deposition 2009, 15:312.
64. Li H., Farmer D.B., Gordon R.G., Lin Y., Vlassak J. J. Electrochem. Soc. 2007, 154:D642.
65. Li H., Aaltonen T., Li Z., Lim B.S., Gordon R.G. J. Open Inorg. Chem. 2008, 2:11.
66. M.L. Hitchman, K.F. Jensen, Chemical Vapor Deposition: Principles and Applications, San Diego, CA, 1993.
67. Utriainen M., Kröger-Laukkanen M., Johansson L.-S., Niinist L. Appl. Surf. Sci. 2000, 157:151.
68. Igumenov I.K. J. Phys. IV 1995, 5:C5.
69. Aaltonen T., Ritala M., Sammelselg V., Leskela M. J. Electrochem. Soc. 2004, 151:G489.
70. Aaltonen T., Ritala M., Leskelä M. Electrochem. Solid State Lett. 2005, 8:C99.
71. Hamalainen J., Hatanpää T., Puukilainen E., Costelle L., Pilvi T., Ritala M., Leskelä M. J. Mater. Chem. 2009, 20:7669.
72. Aaltonen T., Ritala M., Arstila K., Keinonen J., Leskelä M. Chem. Vap. Deposition 2004, 10:215.
73. Kim S.K., Hoffmann-Eifert S., Waser R. J. Phys. Chem. C 2009, 113:11329.
74. Kim Y.-S., Shin J., Cho J.-H., Eyck G.A.T., Liu D.-L., Pimanpang S., Lu T.-M., Senkevich J.J., Shin H.-S. Surf. Coat. Technol. 2006, 200:5760.
75. Feng H., Elam J.W., Libera J.A., Setthapun W., Stair P.C. Chem. Mater. 2010, 22:3133.
76. Kariniemi M., Niinistö J., Hatanpää T., Kemell M., Sajavaara T., Ritala M., Leskelä M. Chem. Mater. 2011, 23:2901.
77. Niskanen A., Hatanpää T., Arstila K., Leskelä M., Ritala M. Chem. Vap. Deposition 2007, 13:408.
78. Juppo M., Ritala M., Leskelä M. J. Vac. Sci. Technol. A 1997, 15:2330.
79. Martensson P., Carlsson J.-O. Chem. Vap. Deposition 1997, 3:45.
80. Törndahl T., Ottosson M., Carlsson J.-O. Thin Solid Films 2004, 458:129.
81. Martensson P., Carlsson J.-O. J. Electrochem. Soc. 1998, 145:2926.
82. Christopher J., Lanford W.A., Christopher J.W., Singh J.P., Pei I.W., Jay J.S., Toh-Ming L. J. Electrochem. Soc. 2005, 152:C60.
83. Raj S., Balu P. Electrochem. Solid State Lett. 2000, 3:479.
84. Huo J., Solanki R., McAndrew J. J. Mater. Res. 2002, 17:2394.
85. Antti N., Antti R., Timo S., Kai A., Mikko R., Markku L. J. Electrochem. Soc. 2005, 152:G25.
86. Li Z., Rahtu A., Gordon R.G. J. Electrochem. Soc. 2006, 153:C787.
87. Lee B.H., Hwang J.K., Nam J.W., Lee S.U., Kim J.T., Koo S.M., Baunemann A., Fischer R.A., Sung M.M. Angew. Chem. Int. Ed. 2009, 48:4536.
88. Knisley T.J., Ariyasena T.C., Sajavaara T., Saly M.J., Winter C.H. Chem. Mater. 2011, 23:4417.
89. Vidjayacoumar B., Emslie D.J.H., Clendenning S.B., Balckwell J.M., Britten J.F., Rheingold A. Chem. Mater. 2010, 22:4844.
90. Vidjayacoumar B., Emslie D.J.H., Blackwell J.M., Clendenning S.B., Britten J.F. Chem. Mater. 2010, 22:4854.
91. Li Z., Barry S.n.T., Gordon R.G. Inorg. Chem. 2005, 44:1728.
92. Wu J., Li J., Zhou C., Lei X., Gaffney T., Norman J.A.T., Li Z.G., Cheng R.H. Organometallics 2007, 26:2803.
93. Lim B.S., Rahtu A., Park J.-S., Gordon R.G. Inorg. Chem. 2003, 42:7951.
94. Lee H.-B.-R., Kim W.-H., Lee J.W., Kim J.-M., Heo K., Hwang I.C., Park Y., Hong S., Kim H. J. Electrochem. Soc. 2010, 157:D10.
95. Lee H.-B.-R., Kim J., Kim H. J. Korean Phys. Soc. 2010, 56:104.
96. Lee H.-B.-R., Kim H. Electrochem. Solid State Lett. 2006, 9:G323.
97. Yoon J., Lee H.-B.-R., Kim D., Cheon T., Kim S.-H., Kim H. J. Electrochem. Soc. 2011, 158:H1179.
98. Kim K., Lee K., Han S., Park T., Lee Y., Kim J., Yeom S., Jeon H. Jpn. J. Appl. Phys. 2007, 46:L173.
99. Lee K., Kim K., Park T., Jeon H., Lee Y., Kim J., Yeom S. J. Electrochem. Soc. 2007, 154:H899.
100. Chae J., Park H.-S., Kang S.-w. Electrochem. Solid State Lett. 2002, 5:C64.
101. Do K.-W., Yang C.-M., Kang I.-S., Kim K.-M., Back K.-H., Cho H.-I., Lee H.-B., Kong S.-H., Hahm S.-H., Kwon D.-H., Lee J.-H., Lee J.-H. Jpn. J. Appl. Phys. 2006, 45:2975.
102. Kim K., Lee K., Han S., Jeong W., Jeon H. J. Electrochem. Soc. 2007, 154:H177.
103. Lee K., Kim K., Jeong W., Park T., Jeon H. Solid State Phenomena 2007, 124-126:359.
104. Kwon J., Saly M., Halls M.D., Kanjolia R.K., Chabal Y.J. Chem. Mater. 2012, 24:1025.
105. Greenfield H., Sternberg H.W., Friedel R.A., Wotiz J.H., Markby R., Wender I. J. Am. Chem. Soc. 1956, 78:120.
106. Qin X., Sun H., Zaera F. J. Vac. Sci. Technol. A 2012, 30:01A112.
107. Lee Y.J., Kang S.-W. Electrochem. Solid State Lett. 2002, 5:C91.
108. Klaus J.W., Ferro S.J., George S.M. Thin Solid Films 2000, 360:145.
109. Grubbs R.K., Steinmetz N.J., George S.M. J. Vac. Sci. Technol. B 2004, 22:1811.
110. Seghete D., Rayner G.B., Cavanagh A.S., Anderson V.R., George S.M. Chem. Mater. 2011, 23:1668.
111. Juppo M., Vehkamäki M., Ritala M., Leskelä M. J. Vac. Sci. Technol. A 1998, 16:2845.
112. Chabal Y.J. Surf. Sci. Rep. 1988, 8:211.
113. Kwon J., Dai M., Halls M.D., Langereis E., Chabal Y.J., Gordon R.G. J. Phys. Chem. C 2009, 113:654.
114. Kim H. Surf. Coat. Technol. 2006, 200:3104.
115. Dai M., Kwon J., Langereis E., Wielunski L.S., Chabal Y., Li Z., Gordon R. ECS Trans. 2007, 11:91.
116. Dai M., Kwon J., Halls M.D., Gordon R.G., Chabal Y.J. Langmuir 2010, 26:3911.
117. Fisher G.L., Hooper A.E., Opila R.L., Allara D.L., Winograd N. J. Phys. Chem. B 2000, 104:3267.
118. Aldakov D., Bonnassieux Y., Geffroy B., Palacin S. ACS Appl. Mater. Interfaces 2009, 1:584.
119. Bao J.-Q., Wang Q., Liu X., Ding L. Surf. Sci. 2008, 602:2250.
120. Seitz O., Dai M., Aguirre-Tostado F.S., Wallace R.M., Chabal Y.J. J. Am. Chem. Soc. 2009, 131:18159.
121. Kim S.K., Lee S.W., Han J.H., Lee B., Han S., Hwang C.S. Adv. Funct. Mater. 2010, 20:2989.
122. Sari W., Eom T.-K., Kim S.-H., Kim H. J. Electrochem. Soc. 2011, 158:D42.
123. Swerts J., Delabie A., Salimullah M.M., Popovici M., Kim M.-S., Schaekers M., Elshocht S.V. Electrochem. Solid State Lett. 2012, 1:P19.
124. Leick N., Agarwal S., Mackus A.J.M., Kessels W.M.M. Chem. Mater. 2012, 24:3696.
125. Sanyal B., Eriksson O. Phys. Rev. B 2008, 77:155407.
126. Liu R., Ke S.-H., Baranger H.U., Yang W. Nano Lett. 2005, 5:1959.
127. Theeuwen S.J.C.H., Caro J., Wellock K.P., Radelaar S. Appl. Phys. Lett. 1999, 75:3677.
128. Tehrani S., Chen E., Durlam M., DeHerrera M., Slaughter J.M., Shi J., Kerszykowski G. J. Appl. Phys. 1999, 85:5822.
129. Lutsev L.V., Stognij A.I., Novitskii N.N. Phys. Rev. B 2009, 80:184423.
130. Matsushima J.T., Trivinho-Strixino F., Pereira E.C. Electrochim. Acta 2006, 51:1960.
131. Landolt D. Electrochim. Acta 1994, 39:1075.
132. Cui C., Li Y., Yuan Z. Adv. Mater. 2012, 535-537:973.
133. Shimizu H., Sakoda K., Shimogaki Y. Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), IEEE International 2011.
134. Natile M.M., Glisenti A. Chem. Mater. 2002, 14:3090.
135. Lin H.-K., Chiu H.-C., Tsai H.-C., Chien S.-H., Wang C.-B. Catal. Lett. 2003, 88:169.
136. Chae J.-O., Pyagai R., Demidiouk V., Moon S.-I., Lee D.-Y., Choi I.-C. React. Kinet. Catal. Lett. 2004, 83:369.
137. Yamaura H., Tamaki J., Moriya K., Miura N., Yamazoe N. J. Electrochem. Soc. 1997, 144:L158.
138. Granqvist C.G., Avendaño E., Azens A. Thin Solid Films 2003, 442:201.
139. Baetens R., Jelle B.P., Gustavsen A. Sol. Energy Mater. Sol. Cells 2010, 94:87.
140. Burriel M., Garcia G., Santiso J., Hansson A.N., Linderoth S., Figueras A. Thin Solid Films 2005, 473:98.
141. Maruyama T., Arai S. J. Electrochem. Soc. 1996, 143:1383.
142. Inoue I.H., Yasuda S., Akinaga H., Takagi H. Phys. Rev. B 2008, 77:035105.
143. Wang G.X., Chen Y., Konstantinov K., Lindsay M., Liu H.K., Dou S.X. J. Power Sources 2002, 109:142.
144. Hsia S.L., Tan T.Y., Smith P., McGuire G.E. J. Appl. Phys. 1992, 72:1864.
145. Lindsaya R., Lauwersa A., Pottera M.d., Roelandtsa N., Vranckena C., Maex K. Microelectron. Eng. 2001, 55:157.
146. Yamamoto H., Naito T., Terao M., Shintani T. Thin Solid Films 2002, 411:289.
147. Liao C.L., Lee Y.H., Chang S.T., Fung K.Z. J. Power Sources 2006, 158:1379.
148. Gua S., Atanasovaa P., Hampden-Smithb M.J., Kodas T.T. Thin Solid Films 1999, 340:45.
149. Jogade S.M., Joshi P.S., Jamadar B.N., Sutrave D.S. J. Nano-Electron. Phys. 2011, 3:203.
150. Burriel M., Garcia G., Santiso J., Abruits A., Saltyte Z., Figueras A. Chem. Vap. Deposition 2005, 11:106.
151. Tyczkowski J., Kapica R., Łojewska J. Thin Solid Films 2007, 515:690.
152. Han B., Choi K.H., Park K., Han W.S., Lee W.-J. Electrochem. Solid State Lett. 2012, 15:D14.
153. Donders M.E., Knoops H.C.M., Sanden M.C.M.v.d., Kessels W.M.M., Notten P.H.L. J. Electrochem. Soc. 2011, 158:G92.
154. Diskus M., Nilsen O., Fjellvag H. Chem. Vap. Deposition 2011, 17:135.
155. Shimizu H., Sakoda K., Momose T., Koshi M., Shimogaki Y. J. Vac. Sci. Technol. A 2012, 30:01A144.
156. Green M.L., Ho M.-Y., Busch B., Wilk G.D., Sorsch T., Conard T., Brijs B., Vandervorst W., Räisänen P.I., Muller D., Bude M., Grazul J. J. Appl. Phys. 2002, 92:7168.
157. Hackley J.C., Gougousi T., Demaree J.D. J. Appl. Phys. 2007, 102:034101.