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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

Thermal chemistry of Mn 2(CO) 10 during deposition of thin manganese films on silicon oxide and on copper surfaces

(3) Qin, Xiangdong a Sun, Huaxing a Zaera, Francisco a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOND DISSOCIATION; CARBON DEPOSITION; COPPER SURFACE; DECARBONYLATIONS; HIGH EXPOSURES; HIGHER TEMPERATURES; MANGANESE SILICIDE; MANGANESE-SILICATE; MULTILAYER GROWTH; NATIVE OXIDES; REACTION MIXTURE; ROOM TEMPERATURE; SI(1 0 0); THERMAL CHEMISTRY;

ATOMIC LAYER DEPOSITION; CARBON FILMS; COPPER; DEPOSITION; MANGANESE; MULTILAYER FILMS; OXIDE FILMS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICATES; SILICIDES; SILICON OXIDES; SILICON WAFERS; STAINLESS STEEL; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

MANGANESE OXIDE;

EID: 84863411690 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3658373 Document Type: Article

Times cited : (25)

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