Remote plasma ALD of platinum and platinum oxide films

Electrochemical and Solid-State Letters

Volumn 12, Issue 7, 2009, Pages

  Knoops, H C M ^a,b   MacKus, A J M ^b   Donders, M E ^a,b   Van De Sanden, M C M ^b   Notten, P H L ^b,c   Kessels, W M M ^b  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH DENSITY; IN-SITU; LOW RESISTIVITY; PLASMA EXPOSURE; PLATINUM OXIDE; PT FILMS; REMOTE PLASMAS; SEMICONDUCTIVE; TEMPERATURE WINDOW; THERMAL ALD;

ATOMIC LAYER DEPOSITION; PLASMA DEPOSITION; PLASMAS; PLATINUM; PLATINUM COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; WINDOWS;

OXIDE FILMS;

EID: 67650392153     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3125876     Document Type: Article

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