Study on the characteristics of aluminum thin films prepared by atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1983-1988

  Lee, Yong Ju ^a   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ASPECT RATIO; DEPOSITION; ELECTRIC CONDUCTIVITY; HYDROGEN; METALLIC FILMS; PLASMA THEORY; POLYCRYSTALLINE MATERIALS; THICKNESS MEASUREMENT; WETTING;

ATOMIC LAYER DEPOSITION (ALD);

THIN FILMS;

EID: 0036863092     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513636     Document Type: Article

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