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Volumn 30, Issue 13, 2007, Pages 32-36

New materials in semiconductor fabrication: An evolutionary process

Author keywords

[No Author keywords available]

Indexed keywords


EID: 37649000749     PISSN: 01633767     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (6)

References (8)
  • 1
    • 0036501613 scopus 로고    scopus 로고
    • Alternative Gate Dielectrics for Microelectronics
    • March
    • R. Wallace and G. Wilk, "Alternative Gate Dielectrics for Microelectronics," MRS Bulletin, March 2002, p. 186.
    • (2002) MRS Bulletin , pp. 186
    • Wallace, R.1    Wilk, G.2
  • 2
    • 0036502104 scopus 로고    scopus 로고
    • A Thermodynamic Approach to Selecting Alternative Gate Dielectrics
    • March
    • D. Schlom and J. Haeni, "A Thermodynamic Approach to Selecting Alternative Gate Dielectrics," MRS Bulletin, March 2002, p. 198.
    • (2002) MRS Bulletin , pp. 198
    • Schlom, D.1    Haeni, J.2
  • 3
    • 37649001704 scopus 로고    scopus 로고
    • Performance Improvement No Longer Possible by Scaling Alone
    • Jan. 12
    • T.N. Theis, "Performance Improvement No Longer Possible by Scaling Alone," SMC Conf., Jan. 12, 2006.
    • (2006) SMC Conf
    • Theis, T.N.1
  • 4
    • 34547409928 scopus 로고    scopus 로고
    • 2 Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperature
    • 2 Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperature," Chem. Mat, 2007, Vol. 19, p. 3319.
    • (2007) Chem. Mat , vol.19 , pp. 3319
    • Niinisto, J.1
  • 5
    • 34249022099 scopus 로고    scopus 로고
    • 2 on Deep Trenched and Planar Silicon
    • 2 on Deep Trenched and Planar Silicon," Microelec. Eng., 2007, Vol. 84, p. 2010.
    • (2007) Microelec. Eng , vol.84 , pp. 2010
    • Kukli, K.1
  • 8
    • 37649013982 scopus 로고    scopus 로고
    • R. Kanjolia, D. Weyburne, R. Odedra, N. Boag and S. Ganguli, Atomic Layer Deposition of Ruthenium Using Novel Organoruthenium Precursors, ALD 2006 (patents pending).
    • R. Kanjolia, D. Weyburne, R. Odedra, N. Boag and S. Ganguli, "Atomic Layer Deposition of Ruthenium Using Novel Organoruthenium Precursors," ALD 2006 (patents pending).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.