Design and development of ALD precursors for microelectronics

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 79-86

  Kanjolia, R K ^a   Anthis, J ^a   Odedra, R ^a   Williams, P ^a   Heys, P N ^a  

^a SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; HIGH-K DIELECTRIC; MICROELECTRONICS; STABILITY CRITERIA; ZIRCONIUM COMPOUNDS;

ALD PRECURSOR; DESIGN AND DEVELOPMENT; DESIGN CRITERIA; ECONOMIC VIABILITY; NOVEL ARCHITECTURE; OXIDE MATERIALS; PRIMARY TECHNOLOGIES; SELECTED METALS;

ATOMIC LAYER DEPOSITION;

EID: 63149119141     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2979983     Document Type: Conference Paper

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