Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NH x radical formation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Shimizu, Hideharu ^a   Sakoda, Kaoru ^a   Momose, Takeshi ^b   Koshi, Mitsuo ^b   Shimogaki, Yukihiro ^b  

^a TAIYO NIPPON SANSO CORPORATION   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON IMPURITIES; CARBON-METAL BONDS; COBALT FILM; COBALTOCENE; DEPOSITION TEMPERATURES; ELEMENTARY REACTION; GAS PHASE KINETICS; HIGH QUALITY; HIGH QUALITY METALLIC FILMS; PHYSISORBED; QUADRUPOLE MASS SPECTROMETER; QUANTUM CHEMICAL CALCULATIONS; RADICAL FORMATION;

ATOMIC LAYER DEPOSITION; CHEMICAL ANALYSIS; COBALT; ORGANOMETALLICS; QUANTUM CHEMISTRY; SURFACE REACTIONS; WIRE;

QUALITY CONTROL;

EID: 84855570068     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3666034     Document Type: Article

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