Plasma-assisted atomic layer deposition of palladium

Chemical Vapor Deposition

Volumn 11, Issue 1, 2005, Pages 60-66

  Eyck, Gregory A Ten ^a   Senkevich, Jay J ^a   Tang, Fu ^a   Liu, Deli ^a   Pimanpang, Samuk ^a   Karaback, Tansel ^a   Wang, Gwo Ching ^a   Lu, Toh Ming ^a   Jezewski, Christopher ^b   Lanford, William A ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

ALD; H2 plasma; Metal organic; Palladium; Plasma assisted

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMISORPTION; DEPOSITION; HYDROGEN; IRIDIUM; METALLIC FILMS; PLASMA SOURCES; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON; TEXTURES; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER CONTROL; ATOMIC LAYER DEPOSITION (ALD); H2 PLASMA; SUBSTRATE TEMPERATURES;

PALLADIUM;

EID: 13844317235     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306312     Document Type: Article

References (32)

1. J. J. Senkevieh, G.-R. Yang, F. Tang, G.-C. Wang, T.-M. Lu, T. S. Cale, C. Jezewski, W. A. Lanford, Appl. Phys. A - Mater. Sci. Process. 2004, 79, 1789.
2. W. Lin, B. C. Weigand, R. G. Nuzzo, G. S. Girolami, J. Am. Chem. Soc. 1996, 118, 5977.
3. Y.-L. Tung, W.-C. Tseng, C.-Y. Lee, P.-F. Hsu, Y. Chi, S.-M. Peng, G.-H. Lee, Organometallics 1999, 18, 864.
4. V. Bhaskaran, M. J. Hampden-Smith, T. T. Kodas, Chem. Vap. Deposition 1997, 3, 85.
5. Atomic Layer Epitaxy (Eds: T. Suntola, M. Simpson), Blackie, London 1990, p. 1.
6. I. K. Igumenov, V. R. Belosludov, P. A. Stabnikov, J. Phys. IV 1999, 9, Pr8-15.
7. K. Itoh, O. Matsumoto, Thin Solid Films 1999 345, 29.
8. W. Lin, T. H. Warren, R. G. Nuzzo, G. S. Girolami, J. Am. Chem. Soc. 1993, 115, 11 644.
9. Y. J. Lee, S.-W. Kang, Electrochem. Solid-State Lett. 2003, 6, C70.
10. J.-S. Park, H.-S. Park, S.-W. Kang, J. Electrochem. Soc. 2002, 149, C28.
11. W. Lin, R. G. Nuzzo, G. S. Girolami, J. Am. Chem. Soc. 1996, 118, 5988.
12. J. J. Senkevich, F. Tang, D. Rogers, J. T. Drotar, G.-C. Wang, T.-M. Lu, Chem. Vap. Deposition 2003, 9, 258.
13. J. J. Senkevich, G.-R. Yang, T.-M. Lu, T. S. Cale, C. Jezewski, W. A. Lanford, Chem. Vap. Deposition 2002, 8, 189.
14. Y. W. Park, N. Inagaki, Polymer 2003, 44, 1569.
15. J.-Y. Yun, S.-W. Rhee, S. Park, J.-G. Lee, J. Vac. Sci. Technol., A 2000, 18, 2822.
16. Y.-B. Park, X. Li, S.-W. Rhee, D.-W. Park, J. Phys. D: Appl. Phys. 1999, 32, 1955.
17. H. Kim, S. M. Rossnagel, Thin Solid Films 2003, 441, 311.
18. H. Kim, A. J. Kellock, S. M. Rossnagel, J. Appl. Phys. 2002, 92, 7080.
19. H. Kim, S. M. Rossnagel, J. Vac. Sci. Technol., A 2002, 20, 802.
20. H. Kim, C. Cabral, Jr., C. Lavoie, S. M. Rossnagel, J. Vac. Sci. Technol., B 2002, 20, 1321.
21. S. Pick, Surf. Sci. 1995, 331-333, 736.
22. J.-C. Hierso, C. Satto, R. Feurer, P. Kalck, Chem. Mater. 1996, 8, 2481.
23. A. Grob, Appl. Phys. A - Mater. Sci. Process. 1998, 67, 627.
24. Gmelin Handbook of Inorganic Chemistry, Pt Suppl. Vol. A1 (Eds: G. J. K. Acres, K. Swars), Springer-Verlag, New York 1986, p. 43.
25. Atomic Layer Epitaxy (Eds: T. Suntola, M. Simpson), Blackie, London 1990, p. 5.
26. M. Brun, A. Bethel, J. C. Bertolini, J. Electron Spectrosc. Relat. Phenom. 1999, 104, 55.
27. J. J. Senkevich, C. J. Mitchell, G.-R. Yang, T.-M. Lu, Colloids Surf. A 2003, 227, 29.
28. S. M. George, A. W. Ott, J. W. Klaus, J. Phys. Chem. 1996, 100, 13 121.
29. A. R. Siedle, R. A. Newmark, L. H. Pignolet, Inorg. Chem. 1983, 22, 2281.
30. R. Wu, A. J. Freeman, Phys. Rev. B: Condens. Matter 1995, 52, 12419.
31. J. Kolaczkiewicz, E. Bauer, Surf. Sci. 1996, 366, 71.
32. F. Tang, C. Gaire, D.-X. Ye, T. Karabacak, T.-M. Lu, G.-C. Wang, unpublished.